Used Karl Suss MJB3

Karl Suss MJB3 Standard Mask Aligner. System capable of exposing partial wafers or substrates up to a maximum size of 3 in. dia. Ask salesperson about available chucks and sizes. Hard or soft contact modes. 365nm to 400nm spectrum of a 200W high pressure arc lamp. Alignment optics consist of normal field microscope with objective turret for different magnifications. 110V, 60 Hz.

Thermo Oriel Accudose 9000 Photospeed Tool. Measures batch to batch photospeed variations. Photoresist testing system. Oriel part 83995 near UV system with fast shutter. Assures that exposure dosage is in-line with your process window requirements. No need to sideline your expensive stepper for photoresist testing. Provides accurate, incremented bulk area exposures across a wafer. Use it to quantify threshold exposure, spectra variations, find potential resist problems and verify lot to lot consistency.

Karl Suss MJB3 Standard Mask Aligner. System capable of exposing partial wafers or substrates up to a maximum size of 3 in. dia. Ask salesperson about available chucks and sizes. Hard or soft contact modes. 365nm to 400nm spectrum of a 200W high pressure arc lamp. Alignment optics consist of normal field microscope with objective turret for different magnifications. 110V, 60 Hz.

Honle UVASPOT 400T High Powered Ultra-Violet UV Curing System. The UVASPOT 400T is used in laboratories and in production processes in widely varying sectors of industry for: Hardening UV reactive polyester resins and casting masses (e.g. tanks, containers, pipes and plastic parts). Testing UV resistance of paints, varnishes, textiles and coatings. Fluorescence testing. Hardening UV reactive adhesives (bonding glass, plastic, metal as well as electronic, precision mechanical and optical components). UV radiation in chemical, biological and pharmaceutical research and production. Coating PC boards. Custom cabinet with pull-out tray: 21 in. x 23 in. 230V, 50 Hz, CE.

Oriel 87437-1000 UV Flood Exposure System. 500W UV lamp housing operating in the 350 to 450nm spectral region. Beam Size: 8” x 8”. 200-500W Hg arc lamp power supply. System needs new power supply and electronics inside tower. Needs controller upgrade.

AB-M Mask Aligner and UV Exposure System. 350W lamp housing with power supply, currently configure with 200W bulb. Precision alignment stage.
Mask Holder: 4” x 4” with 3” diameter substrate holder. Chuck and mask holder available for 2" substrates also. System will not do larger substrates.
Exposure timer. Splitfield Zeiss microscope for easier alignment. 120V, 50/60 Hz.

UVOCS T10X10 UV Ozone Cleaner. Organic contamination removal accomplished by the combination of ultaviolet light and ozone. Source Size: 10” x 10”. Active Area: 100 square inches. 110V, 60 Hz, 2.5A

SEN LIGHTS CORP. PL17-110E Desktop UV Ozone Cleaning System. Manual Shutter.

• Model number: PL17-110
• Body (internal manual shutter)
• Size (mm): 300 x 290 x 310
• Ultraviolet rays wavelength: 254nm
• Ultraviolet rays illuminance: 15mW/cm2
• Irradiation distance: 20 - 75mm
• Light source side, sample pedestal size: 160 x 160mm

Semiconductor Equipment Corp 365 UV Tape Exposure System. Revolutionary new design cures UV tapes quickly and uniformly, features a long life light source and handles all size wafers up to 300mm. The Model 365 UV exposure system needs no external ventilation and has a small footprint.

Model 365 Capabilities:

• Cures most UV tape in 5 seconds
• Large exposure area cures up to 300mm wafers.
• Film Frame masks available.
• Programmable N₂ purge and cure time
• Touch screen control
• Safety interlock to prevent operator exposure to UV light
• Self diagnostic (alarm if LED fails, identifies faulty LED module)
• 10,000 hour LED life
• Generates no ozone
• Cooling fans temperature controlled

Specifications:

• 70mW per sq. centimeter @ 365nM wavelength
• 21.5” wide X 31.5” long X 5.5” high
• Weight: 55 pounds
• Power: 115 VAC; 3.5 amp; 50/60 Hz
• Cover gas: N₂ 20 psi @ 0.5 CFM

OAI Model 806 MBA NUV 4" Mask Aligner is a four-camera, manual, optical backside mask aligner system that is designed to greatly surpass the performance of IR backside aligners. Provides full optical backside alignment and is ideal for use in R&D labs, universities, and low volume production. Built on an anti-vibration table, the fixed mask holder assembly virtually guarantees alignment accuracy and repeatability. Using the Model 806 MBA is a simple process, as all functions are controlled via the easy to read LCD screens. Currently configured with 4" wafer chuck. 500 watt NUV lamp housing with 365-440nm mirrors. Sub-micron level-to-level alignment. High efficiency, uniform exposure system Intensity controlled power supply. User definable operational parameters. Modular design. Motorized backside focus. Dual video cameras with LCD screens. Very versatile, front/backside optical alignment system. SYSTEM NO LONGER SUPPORTED BY OAI. We will fully test the system and make sure it is in good working condition at time of sale.