Used Process Products Corporation RTM 2018H-BT-M 2FM-ADS-SP

Inventory Number: 58938
Now (USD): $4,950.00

Rapid Thermal Processing Batch Furnace. Digital controllers. Ambient to 1200 deg C. Quartz Chamber: 8 in. ID x 24 in. D. Automatic door assembly, double O-Ring vacuum sealed. 208V, 3 Ph, 60 Hz. Furnace only. No addition: Quartzware or vacuum pump.

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Used Jipelec JetFirst 150

Inventory Number: 61568
Now (USD): $32,500.00

Rapid Thermal Processing System with Vacuum Chamber. PC controller. Temperature measurement control system provides accurate and repeatable thermal control across the temperature range. Temperatures up to 1300 deg C. Multi-zone halogen lamp furnace. Ramp Rate: 1 deg C/s to 400 deg C/s. Max. Substrate Size: 6 in. dia. Process gas lines. Includes roughing pump. 220V, 3 Ph, 50/60 Hz, 100A, CE. Unit will be tested for an accuracy of +/-5 deg C from setpoint.

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Used Modular Process Technology RTP-600S

Inventory Number: 61828
Now (USD): $19,500.00

Rapid Thermal Processing System. The integrated process control system features real time graphics, recipe management, data aquisition and has a comprehensive diagnostic function. Wafer size up to 6 in. Temp. Range: 250 to 1300 deg C. Quartz chamber. Up to six channels of MFC control. Highly uniform loop array with accurate control and monitoring. 208V, 3 Ph, 60 Hz, 80A.

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Used Modular Process Technology RTP-600S

Inventory Number: 61866
Now (USD): $19,500.00

Rapid Thermal Processing System. The integrated process control system features real time graphics, recipe management, data aquisition and has a comprehensive diagnostic function. Wafer size up to 6 in. Temp. Range: 250 to 1300 deg C. Quartz chamber. Up to six channels of MFC control. Highly uniform loop array with accurate control and monitoring. 208V, 3 Ph, 60 Hz, 80A.

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Used AG Associates 610

Inventory Number: 62084
Now (USD): $15,000.00

Rapid Thermal Processor. Benchtop system for rapid thermal processing of semiconductor wafers up to 6 in. dia. (depends on wafer tray). Programmable ramp up rates. Peak Temp.: 1350 deg C. Steady State Temp. Range: 400 to 1150 deg C. 208V, 1 Ph, 60 Hz, 100A.

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Used Surface Science Integration Solaris 150

Inventory Number: 62776
Now (USD): $19,500.00

RTP Benchtop Rapid Thermal Annealing System. The Solaris 150 is a manual loading RTP system for R&D and preproduction. Can process up to 152.4mm substrates at a temperature range from RT- 1300 degrees. The unique temperature measurement system of the Solaris requires virtually no calibration for different wafer types and backside emmissivity differences. The Solaris uses a unique PID process controller that ensures accurate temperature stability and uniformity. The system can accommodate interlocked MFCs for gas mixing and forming gas processing. The Solaris is designed for silicon implant annealing and monitoring and compound semiconductor implant activation and ohmic alloying. Excellent repeatability by use of state of the art thermocouple signal conditioning. User friendly software that allows users to interact with data including nine different graphing options.

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