Sputtering Systems

Gencoa Planar Magnetron Cathode. Target Area: 29-1/2 in. x 4-7/8 in. Gas input. With cart for maintenance of cathode.

Gencoa Planar Magnetron Cathode. Magnetron cathode for sputtering over a large area. Target Size: 29-1/2 in. x 4-7/8 in.

Gencoa Planar Magnetron Cathode. Magnetron cathode for sputtering over a large area. Target Size: 29-1/2 in. x 4-7/8 in.

Denton Vacuum Desk IV Standard Sputter Coater for SEM Samples. Provides a uniform, conductive, fine grained coating. Self-contained unit with built-in pump. Advanced design magnetron sputterhead for truly cold sputtering.  Etch mode for sample cleaning.  6” OD pyrex chamber.  Sputters precious metals, no target included. Does not require gas. 120V, 50/60 Hz, 10A

Denton Vacuum DV 502A Discovery 14 DC Sputtering System. Currently configured with a single DC Magnetron Cathode with a 4" diameter target area. 6" diameter rotating substrate holder with rotation speed control. Inficon crystal deposition monitor. Single MFC controlled process gas input. Automatic vacuum pumpdown controls. CTI 8 Cryo pump with compressor and roughing pump. 208V, 1Ph, 60Hz

Denton Vacuum Explorer 14 Three Target RF/DC Sputtering System. Includes etch. Vacuum deposition system designed for thin film research applications. Graphic user interface and touch screen control. The system is fully automatic or can be run manually. Features a box coater design that provides easy access to substrates, sources, and instrumentation while maintaining excellent pumping characteristics. System utilizes a turbomolecular high vacuum pump with roughing pump. Three DC/RF magnetron cathodes each with a shutter. Variable source to substrate distance. Cathodes are mounted confocally for sputter down.  Cathode size is approximately 3” dia. Substrate holder 6” dia. Unit is configured with substrate heater. Single MFC gas input. Deposition chamber 14” H x 14” W x 14” D stainless construction. 208V, 50/60Hz, 100A