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Plasma Etchers - Ashers - Ion Mills

Used Gatan 600 CTMP

Inventory Number: 53783
Now (USD): $10,950.00

Turbo Pumped Argon/Reactive Plasma DuoMill Dual Station Ion Milling System. Ion milling system for the preparation of high quality TEM specimens. Two independent milling stations mounted on a single high speed vacuum system. Each milling station has a Whisperlok specimen exchange system which functions without disturbing the vacuum or milling conditions of the other station and two Octogun ion guns.

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Used March Instruments CS 1701

Inventory Number: 55116
Now (USD): Contact for Price

THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR MARCH INSTRUMENTS SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL. * * * * * * * * * * * * * * * * * * * * * * * * * * Benchtop Reactive Ion Etching System (RIE). Tabletop plasma RIE system. Microprocessor control system provides user with flexibility and ease of use. Four MFC gas inputs. Capable of processing substrates up to 6 in. dia. RF generator 600W, 13.56 MHz. Includes vacuum pump.

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Used March Instruments Jupiter II

Inventory Number: 38966
Now (USD): Contact for Price

THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR MARCH INSTRUMENTS SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL. * * * * * * * * * * * * * * * * * * * * * * * * * * Tabletop Reactive Ion Etcher. Parallel plate reactive ion etcher capable of handling up to a 6 in. wafer. 300 Watt 13.56 MHz RF Generator. Currently configured for one process gas and an N2 purge gas. Can be upgraded to handle 4 process gas inputs. With pump.

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Used March Instruments PX 1000E8

Inventory Number: 58786
Now (USD): $21,500.00

Plasma Asher/Etcher with Pneumatic Vertical Door. Batch system for plasma cleaning or etching. Currently configured with one shelf set: 17 in. x 14 in. Can accommodate multiple shelves. RFX 600 13.56 MHz RF generator. Two gas inputs. Does not include vacuum pump at this price, additional cost depending on type required.

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Used March Instruments PX 1000

Inventory Number: 58161
Now (USD): $21,500.00

Plasma Etcher/Cleaner. Batch systems for plasma cleaning or etching. Currently configured with only one 17 in. x 14 in. shelf set. Can accommodate multiple shelves. RFX-600 13.56 MHz, 600W RF generator. Two gas inputs. Does not include vacuum pump at this price, additional cost depending on type required.

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Used March Instruments PX 500

Inventory Number: 61019
Now (USD): $21,000.00

Plasma Treatment System. Ideal for plasma treatments of hybrids, flat panel displays, BGA’s, lead frames, optics, multi-chip mods, flex circuit panel, plastics, automotives and medical/device. Gas plasma treatment provides a fast efficient method for surface treatment and cleaning prior to wire bonding, die attach, encapsulation, conformal coating and other processes. Chamber Size: 12 in. L x 12 in. W x 20 in. H. RF Power: 13.56 MHz, 600W solid state. 110V, 50/60 Hz, 20A. No vacuum pump at this price.

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Used March Plasma Systems FlexTRAK

Inventory Number: 62748
Now (USD): $45,000.00

Plasma Treatment System. Ultimate application flexibility for direct, downstream and ion-free (patented) plasma, which allows treatment without exposure to ion and UV. Easily integrates with a variety of process equipment including wire bond, die attach, dispense, mold and marking. Slim structure that requires minimal floor space, all service components are easily accessible from the front. Compact, three-axis symmetrical chamber and proprietary process control for unmatched process uniformity. The Nordson March FlexTRAK™ platform provides unparalleled treatment uniformity and process consistency. Electrodes: Variable Electrode Configurations: Power-Ground, Ground-Power, Power-Power. Working Area: 305W x 305D (12 in. W x 12 in. D). RF Power: Standard Wattage: 600W. Frequency: 13.56 MHz. Gas Control Max. No. of MFCs four, only two installed. Control & Interface: Software Control: EPC with PC based touchscreen interface.

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Used Masteretch Etching Machine

Inventory Number: 62844
Now (USD): $3,950.00

Spray Etching Machine. Conveyorised spray etching machine with integral rinse section. Conveyor width 300mm. Conveyor control DC shunt motor with digital readout speed control. Conveyor drive 1 to 1 polypropylene drive gears.

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Used Metroline/IPC 7102

Inventory Number: 56528
Now (USD): $15,000.00

Automatic Plasma Treatment and Cleaning System. Menu driven programming with multi-step features. Parallel plates electrodes mounted vertically. Total of four sets with a surface area of 13 in. H x 28 in. D and a spacing of 1 in. between plates. Two gas inputs controlled via MFC. PE-2500 RF generator. Includes vacuum pump.

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Used Novellus Gasonics PEP Iridia DL

Inventory Number: 60586
Now (USD): $110,000.00

Plasma Asher. The Novellus PEP Iridia integrates production proven technologies to offer high-throughput implant strip and post-etch clean process solutions. Iridia’s Directional Downstream Plasma source is comprised of a directional RF source paired with a versatile, downstream microwave source. The integrated lamp module with state-of-the-art, closed-loop wafer temperature control enables multi-temperature processing in a single chamber. Designed for aggressive fluorine and reducing chemistries, the Iridia offers unsurpassed flexibility in handling your production needs, including high dose implant strip (HDIS), Front End of Line (FEOL) cleans, and post-etch cleans for aluminum and copper interconnects.  Was fully functional when deinstalled.  Will be fully tested at time of sale.  Through-the-Wall Installation. Wafer Handler: PEP 4800DL(H). Build Configuration: 95-0526. Dual Cooling Stations. Kensington DUAL MULTI-LINK Robot. Controller Model 4000C, s/n 97-396-96. Controller: IBM 7587 w/CD-ROM. 208VAC, 60Hz, 3Phase WYE, 30A. Left Module: PEP4800DL (L). Build Configuration: 51-2035. Astex Microwave Generator. ENI ACG-5XL RF Generator. Process Controller: IBM 7587. Gas Configuration: CF4, N2, 4 percent H2/N2, O2, CF4, N2. Right Module: PEP-4800DL (R). Build Configuration: 51-2036. Astex Microwave Generator. ENI ACG-5XL RF Generator. Process Controller: IBM 7587. Gas Configuration: CF4, CF4, N2, CDA, N2, O2, 4 percent H2/N2. Does not include vacuum pumps or water chiller.

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