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Plasma Etchers - Ashers - Ion Mills

Used Anatech SP100

Inventory Number: 62871
Now (USD): $9,500.00

Table Top Plasma System. For plasma cleaning of small parts or for modifying surfaces. Digital countdown timer. Analog pressure display. Gas flow with needle valve control. RF Power Source: 100W at 13.56 MHz. Quartz Chamber: 4 in. x 8 in. Includes vacuum pump. 110V, 60 Hz, 10A.

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Used Gatan 600 CTMP

Inventory Number: 53783
Now (USD): $10,950.00

Turbo Pumped Argon/Reactive Plasma DuoMill Dual Station Ion Milling System. Ion milling system for the preparation of high quality TEM specimens. Two independent milling stations mounted on a single high speed vacuum system. Each milling station has a Whisperlok specimen exchange system which functions without disturbing the vacuum or milling conditions of the other station and two Octogun ion guns.

Product Details

Used March Instruments PX 1000E8

Inventory Number: 58786
Now (USD): $21,500.00

Plasma Asher/Etcher with Pneumatic Vertical Door. Batch system for plasma cleaning or etching. Currently configured with one shelf set: 17 in. x 14 in. Can accommodate multiple shelves. RFX 600 13.56 MHz RF generator. Two gas inputs. Does not include vacuum pump at this price, additional cost depending on type required.

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Used March Instruments PX 500

Inventory Number: 61019
Now (USD): $21,000.00

Plasma Treatment System. Ideal for plasma treatments of hybrids, flat panel displays, BGA’s, lead frames, optics, multi-chip mods, flex circuit panel, plastics, automotives and medical/device. Gas plasma treatment provides a fast efficient method for surface treatment and cleaning prior to wire bonding, die attach, encapsulation, conformal coating and other processes. Chamber Size: 12 in. L x 12 in. W x 20 in. H. RF Power: 13.56 MHz, 600W solid state. 110V, 50/60 Hz, 20A. No vacuum pump at this price.

Product Details

Used March Instruments Jupiter II

Inventory Number: 63005
Now (USD): $15,000.00

Tabletop RIE Reactive Ion Etcher. Parallel plate reactive ion etcher, currently configured for 4 in. wafers. 300W 13.56 MHz RF generator. Currently configured for three process gas and N2 purge. Does not include vacuum pump. Older system but will be sold in good operating condition.

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Used Metroline/IPC 7102

Inventory Number: 56528
Now (USD): $15,000.00

Automatic Plasma Treatment and Cleaning System. Menu driven programming with multi-step features. Parallel plates electrodes mounted vertically. Total of four sets with a surface area of 13 in. H x 28 in. D and a spacing of 1 in. between plates. Two gas inputs controlled via MFC. PE-2500 RF generator. Includes vacuum pump.

Product Details

Used Novellus Gasonics PEP Iridia DL

Inventory Number: 60586
Now (USD): $60,000.00

Plasma Asher. The Novellus PEP Iridia integrates production proven technologies to offer high-throughput implant strip and post-etch clean process solutions. Iridia’s Directional Downstream Plasma source is comprised of a directional RF source paired with a versatile, downstream microwave source. The integrated lamp module with state-of-the-art, closed-loop wafer temperature control enables multi-temperature processing in a single chamber. Designed for aggressive fluorine and reducing chemistries, the Iridia offers unsurpassed flexibility in handling your production needs, including high dose implant strip (HDIS), Front End of Line (FEOL) cleans, and post-etch cleans for aluminum and copper interconnects.  Was fully functional when deinstalled. Through-the-Wall Installation. Wafer Handler: PEP 4800DL(H). Build Configuration: 95-0526. Dual Cooling Stations. Kensington DUAL MULTI-LINK Robot. Controller Model 4000C, s/n 97-396-96. Controller: IBM 7587 w/CD-ROM. 208VAC, 60Hz, 3Phase WYE, 30A. Left Module: PEP4800DL (L). Build Configuration: 51-2035. Astex Microwave Generator. ENI ACG-5XL RF Generator. Process Controller: IBM 7587. Gas Configuration: CF4, N2, 4 percent H2/N2, O2, CF4, N2. Right Module: PEP-4800DL (R). Build Configuration: 51-2036. Astex Microwave Generator. ENI ACG-5XL RF Generator. Process Controller: IBM 7587. Gas Configuration: CF4, CF4, N2, CDA, N2, O2, 4 percent H2/N2. Does not include vacuum pumps or water chiller.  Sold As Is. Not actual photos, contact for photos in current status.

Product Details

Used Oxford Instruments Plasmalab 180 ICP

Inventory Number: 62276
Now (USD): $99,000.00

ICP Inductively Coupled Plasma High Density Etching System. The Plasmalab System 100 ICP 180 is a load locked plasma etching system configured for reactive ion etching with ICP (Inductively Coupled Plasma) source. The system control is done by computer which provides fully automatic operation. Maximum substrate size 150 mm, currently configured for 100 mm wafers. Chuck type mechanical clamping. Backside helium cooling. Alcatel turbo pump with controller and roughing pump. Gas box with six MFC gas controllers. Previously used gases CHF3/CHF4, C3F8, C4F8, Argon, Oxygen, Hydrogen, Chlorine. 208V, 3 Ph, 50/60 Hz.

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Used Oxford Instruments 90 Plus RIE

Inventory Number: 62737
Now (USD): $69,000.00

RIE Reactive Etcher with Loadlock. Small batch load-locked RIE with 275 mm electrode. Easy to use computer interface controls all system functions. 13.56 MHz RF generator, 600W. Gas box with four MFC. Previous gases used: Oxygen, Boron Trichloride, Chlorine and Nitrogen. Includes roughing pump.

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Used Oxford Instruments Plasmalab 80 Plus RIE

Inventory Number: 62752
Now (USD): $15,000.00

Plasma System.  RF matching network mounted on top of chamber. ENI ACG-3 13.56 MHz 300W RF generator. 6-inch diameter platen. Does not include vacuum pump. 208V, 3 Ph, 50/60 Hz, CE. Sold As Is.

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