Scanning Electron Microscopes

Jeol JWS-7515 In-Line Wafer Inspection Electron Microscope. Field emission electron gun. Oxford ISIS EDS detector with cryo compressor (LN2 free operation). Resolution: 8 nanometer. Magnification: 100X to 200,000X. Accelerating voltage up to 12 kV. 4 axes goniometer stage. AS IS Price: $15,000.

Jeol JWS-7555 Wafer Inspection SEM. Cassette to robot handling. Magnification to 200,000. Specimen Stage: 4 axis goniometer with 200 mm X-Y travel and tilt -15 to 60 degrees. Field emission electron gun. Date of Mfg.: 1999. CE marked. AS IS Price: $15,000.

Jeol JWS-7515 In-Line Wafer Inspection Electron Microscope. Field emission electron gun. EDS detector with cryo compressor (LN2 free operation). Resolution: 8 nm. Magnification: 100X to 200,000X. Accelerating voltage up to 12 kV. 4 axis goniometer stage. AS IS Price: $15,000.

Zeiss EVO 50 Research Grade Variable Pressure Scanning Electron Microscope. A broad range of applications in Nano Technology. The EVO 50 series provides a large chamber that can accommodate a variety of both conductive and non-conductive specimens in High Vacuum, Extended Variable Pressure (XVP®) or Extended Pressure (EP). The chamber can handle a 250mm dia. specimen. Equipped with cathode illumination detector, a Variable Pressure SED, a Four-Quadrant Backscatter Detector and an Oxford EDS System. Resolution: 3.0nm at 30 KV with SED and tungsten filament, 4.5nm at 30 KV with BSD and XVP mode. Motorized stage. Accelerating Voltage: 5 KV to 30 KV. Magnification: 5 to 1,000,000X. Powered by 100-240VAC, 1 Ph, 50/60 Hz, CE. Oxford EDS included but not tested or warranteed.

Cameca SU30 Scanning Electron Microprobe. Automated analytical scanning electron microscope for rapid, highly accurate analysis. Consists of 2 wavelength spectrometers, wavelength dispersion spectrometer and energy dispersion spectrometer. Runs on Sun Station Unix computer. 4 nm resolution secondary electron image. 15 to 400,000X magnification. Sold As Is.