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Photoresist: Coaters - Tracks

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Used Headway Research PWM32/CB-15

Inventory Number: 63217
Now (USD): $7,500.00

Headway Research PWM32/CB-15 6 ft. Wet Bench with Photoresist Spinner. Headway PWM32 digital spinner controller with a 15” dia. spinner mounted in the wet bench. Wet bench includes a sink with water spigot 12” x 12” x 12”. One Rinse Tank: 9” L x 7½” W x 7” H. Single Bath: 10” L x 8” W x 6” H.

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Used Laurell EDC-650-15NPP

Inventory Number: 63759
Now (USD): $6,500.00

Laurell EDC-650-15NPP Etch Develop Clean Process Spinner. This advanced research and development tool is flexible, safe and affordable. The EDC series is typically employed for both solvent and aqueous-based processing: Etch-Rinse-Dry, Develop-Rinse-Dry, as well as solvent and aqueous cleaning. The spin processor features zero-porosity Teflon® fluid path with an onboard dispense valve manifold. A clear ECTFE dome shaped lid allows safe visibility of your process as it runs, even during single step process development mode. FULLY TESTED AND READY TO SHIP.

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Used Laurell WS-500-8TFM

Inventory Number: 60386
Now (USD): $5,500.00

Laurell WS-500-8TFM WS-500 Series Spin Processor Developing Station for up to 200mm Wafers. For cleaning, etching, developing processes on wafers up to 200mm. Features a locked, counter balanced, clear dome chamber for a protected view of the process without exposure to vapors or chemicals. Up to 20 fifty step programs can be stored in the controller. 120V, 60 Hz. UNIT HAS BEEN TESTED AND IS READY TO GO.

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