Category Feed Subscribe to this Channel's RSS Feed

Photoresist: Coaters - Tracks

Used Cee 100CB

Inventory Number: 46892
Now (USD): Contact for Price

THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR CEE SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL. * * * * * * * * * * * * * * * * * * * * * * * * * * Benchtop Spin Coater and Hot Plate. Maximum substrate size: 200mm round or 6 in. x 6 in. sq. Fully programmable with multi-step processing. Controlled spin environment for ultra high uniformity film thickness. Spin speed: 0 to 6000 rpm. Acceleration: 1 to 30,000 rpm/sec. Hot plate temp. range: 50 to 300 deg C. Hot chuck size: 10 in. x 10 in.

Product Details

Used Cee 4500D

Inventory Number: 58257
Now (USD): $29,000.00

Cassette to Cassette Photoresist Developer Track with Hot Plate Bake and Chill. System was used in research environment to process 6 in. sq. substrates. Consists of two elevator units, one teflon bowl with four dispense valves, one hot plate bake unit and one cool plate. The spinner parameters are programmable via multiline control panel. The hot plate temperature range is 50 deg C to +300 deg C and is programmable. Vacuum contact, proximity and gravity contact.

Product Details

Used Cee 4000

Inventory Number: 58289
Now (USD): $4,000.00

Cassette to Cassette Photoresist Spinner with Hot Plate Bake and Cool. Fully programmable automated coat/bake track system. Currently configured for 6 in. squares. Spinner with backside rinse. Max. Spin Speed: 6000 rpm. Programmable acceleration control from 1 to 30,000 rpm/sec. Storage of 10 recipes with up to 10 steps/recipes. Hot Plate Max. Temp.: 300 deg C. Programmable proximity, gravity contact and vacuum contact. Cooling plate. Sold As Is Untested.

Product Details

Used Cee Brewer Science 200CB

Inventory Number: 62379
Now (USD): $9,500.00

Photoresist Spin Coater and Hot Plate Combination Tool. Features the accuracy and repeatability needed to eliminate processing variability from photoresist and thin film deposition processes. User friendly interface touch screen with expanded multi-level programming. Can accommodate substrates up to 200mm round or 7 in. square. 115V, 50/60 Hz, 15A.

Product Details

Used FAS Technologies MicroE™ 200

Inventory Number: 42576
Now (USD): $32,000.00

Extrusion Coating System. Uses high precision extrusion technology to coat materials in a wide range of viscosities. Coats very thick layers (100 micrometers) in a single step. Repeatable digitally programmed process. Greater material utilization than spin coating (typical 75 percent of dispensed material remains on the wafer).

Product Details

Used FAS Technologies MicroE™ 200

Inventory Number: 42901
Now (USD): $39,000.00

Cassette to Cassette Extrusion Coating System with Stacked Bake/Chill Oven. System is capable of coatings over 100 micron thick in one process step with uniformities surpassing +/- 2 percent. Material utilization is 75 percent compared to 5-10 percent for spin coating. This means lower cost of material and reduced expense of waste disposal. Increased process uniformity. Uses high precision extrusion technology. Ability to coat materials in a wide range of viscosities. Repeatable digitally programmed process. With Genmark Mini Max Gencobot 7S/3L Handler. Model JS-9940 stacked bake unit with 3 ovens.

Product Details

Used Headway Research CB-15

Inventory Number: 55891
Now (USD): Contact for Price

THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR HEADWAY RESEARCH SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL. * * * * * * * * * * * * * * * * * * * * * * * * * * Photoresist Spinner. Capable of spinning up to 9 in. dia. substrates. EC101-D controller. 15 in. dia. bowl. RPM Range: 50 to 10,000. Acceleration: 0.25 sec. to 1.25 sec. 115V, 50/60 Hz, 3A.

Product Details

Used Headway Research PWM32-PS-R790

Inventory Number: 60114
Now (USD): $3,950.00

Photoresist Spinner with Digital Programmable Controller. Mounted in a Headway cabinet. Up to 10,000 rpm for relatively light loads such as silicon wafers, small photomasks. Maximum substrate size up to 5-inch. Does not have dispense pumps or lines. Will need vacuum source for wafer hold-down. 120V, 60 Hz.

Product Details

Used Headway Research PWM32-R790

Inventory Number: 61325
Now (USD): $5,250.00

Photoresist Spinner Mounted in Exhaust Hood Table. Spin coater for substrates up to 5 in. diameter or diagonal. The bowl diameter is 7.9 in. ID. Up to 10,000 rpm for relatively light loads such as silicon wafers or small photomasks. Two HDP98 pump fluid dispensers included at no additional price but these are not tested or part of warranty. PWM32 digital controller. Unit is mounted on a table with a stainless fume hood. 120V, 50/60 Hz, 10A.

Product Details

Used Headway Research 1-PM101D-R485

Inventory Number: 62322
Now (USD): $2,500.00

Photo Resist Spinner with Motor Control Unit. Extremely versatile and reliable line of equipment for coating silicon and germanium wafers and large glass and ceramic substrates with photo sensitive material. Great flexibility for labor production line. Close loop servo control amplifier and electro-dynamic brake. Digital tachometer and automatic cycle timer. Adjustable acceleration from 50 to 5,000 rpm/sec. 8-inch dia. bowl. Vacuum chuck.

Product Details