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Used - Cryotorr 8

Inventory Number: 64594
Now (USD): $1,500.00

CTI Cryotorr 8 Cryo pump. Needs rebuild. Sold As is

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Used Abbess Instruments 24" Vacuum Chamber

Inventory Number: 64862
Now (USD): $11,000.00

Abbess Instruments 24 Inch Cube Vacuum Chamber with Dry Pump. Constructed of welded aluminum alloy with interior standard dimensions of 24″ high x 24″ deep x 24″ wide. Full clear Acrylic door. Vacuum valve control and purge control. Adixen ACP 40 Dry multi-stage Roots technology with a Pumping speed of max. 40 m3/h

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Inventory Number: 64572
Now (USD): $29,000.00

ABM High Performance Tabletop Deep UV Mask Alignment and DUV Exposure System. Table top mask aligner. Adjustable vacuum contact or proximity printing. Precision alignment module for piece parts up to 4” maximum, currently configured with a 100mm diameter chuck. Different sizes available at additional price. Uniform collimated exposure beam, final lens diameter is 6.5”. Wavelength: 220nm. 500W power supply. Dual cameras for alignment. 120V, 50/60 Hz.

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Used Advanced Energy RFX 600

Inventory Number: 64762
Now (USD): $2,000.00

Advanced Energy RFX 600 Plasma 13.56Mhz 600W RF Generator. Intended for continuous hard use in a vacuum environment. Multiple regulation modes and superior arc quenching make this an industry leader. Digital display and setpoint. Power: 600W into a 50 ohm load. Frequency: 13.56 MHz. Cooling: Forced air. Max. Ambient Temp.: 45°C, 92% relative humidity. Free airflow must be provided. RF Output Connector: Type N. 208V, 1Ph, 50/60 Hz 3 AVAILABLE

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Used Advanced Energy RFX 600 ATX 600

Inventory Number: 64761
Now (USD): $2,250.00

Advanced Energy RFX 600 13.56Mhz 600W RF Generator w/ ATX-600 Matchwork controller. Air cooled RF generator with an output frequency of 13.56 Mhz and a maximum power out of 600 watts. Also included is an ATX 600 matching network controller. There is not a matching network with the units. 208V, 1Ph, 50/60Hz.

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Used Affinity FAE-121L-EE10CAD4

Inventory Number: 61977
Now (USD): $5,950.00

Affinity FAE-121L-EE10CAD4 Air Cooled Recirculating Chiller. Refrigerent: R407. Nominal Heat Removed: 9.8 kW at 20 deg C. Pump Performance: 10 gpm at 55 psi. 1-3/4 inch NPT coolant supply/return lines. 460, 277, 380V, 3 Ph, 50/60 Hz, 37A, CE.

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Used Agilent Cary 6000i UV-VIS-NIR Spectrophotometer

Inventory Number: 64710
Now (USD): $25,000.00

Agilent Cary 6000i UV-VIS-NIR Spectrophotometer. The Cary 6000i UV-Vis-NIR spectrophotometer has been tailored for unmatched photometric performance in the short-wave infrared (SWIR) 800–1800 nm range as well as the UV-visible 175 to 800 nm. The superior sensitivity of the narrow-band InGaAs detector is optimally harnessed by preferencing the spectrophotometer’s optical throughput in the SWIR region. Its 600 lines-per-mm NIR diffraction grating, blazed at 1000 nm, concentrates optical dispersion into the 800–1800 nm region, eliminating wasted photons that would otherwise fall beyond the range of the detector. The Cary 6000i is your ultimate tool for materials characterization spectroscopy. Date of MFG 2018.

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Used AITEC AR-SV3G-100

Inventory Number: 64612
Now (USD): $2,950.00

AITEC AR-SV3G-100 Wafer Transfer Robot. Was used in a vacuum cluster tool. No cables or controllers.

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Used Alessi REL-4500

Inventory Number: 64846
Now (USD): $5,950.00

Alessi REL-4500 150mm Manual Analytical Wafer Prober. Vacuum Chuck: 6” dia. (150mm). Manual XY stage movement: 6” X x 6” Y.  Platen accepts vacuum or magnetic base probe manipulators. Mitutoyo microscope with single long working distance objective. Manual quick lift platen.

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Used Allwin21 Accuthermo AW610

Inventory Number: 64820
Now (USD): $35,000.00

Allwin21 Accuthermo AW610 Rapid Thermal Processor.

The AccuThermo AW610 is a rapid thermal processing (RTP) system, which uses high intensity visible radiation to heat single wafers for short process periods of time at precisely controlled temperatures. The process periods are typically 1‑600 seconds in duration, although periods of up to 9999 seconds can be selected. The AccuThermo RTP AW610M rapid thermal annealing system consists of an oven unit and a controller computer running the Allwin21 RTAPRO controller software. The wafer to be processed is placed on a quartz tray that slides into a quartz isolation tube in the oven unit. Four banks of lamps, two above the quartz tube and two below it, provide the source of energy for heating the wafer. The lamps can be controlled manually and automatically from the controller computer. The RTAPRO control software allows full control and diagnostics of the AccuThermo RTP system.  In addition, it allows the creation of recipes for automated control of the temperature and, optionally, process gas flow. The control software uses a set of operating instructions known as recipes to automatically control the AccuThermo RTP system. These recipes are created by the Process Engineer to monitor and control the parameters of the processing cycle. The Operator then uses the software to select and run the process parameters (steady state temperature, process time, ramp rates, etc.).

HEATPULSE 610 Features


Manually loaded and capable of processing silicon and III-V substrates up to 150mm in diameter, Heatpulse 610 provides solutions to your process development and monitoring needs. Equipped with a graphical user interface to improve operator productivity, Heatpulse 610 offers recipe management and system diagnostics.


HEATPULSE 610 Major System Features


  • Semiconductor grade quartz process chamber
  • 21 tungsten halogen lamps in an upper and lower array
  • Extended Range Pyrometer: 400°C -1300oC (200°C w/TC)
  • Graphical User Interface(GUI)


These capabilities, combined with the heating chamber’s cold-wall design and superior heating uniformity, provide significant advantages over conventional furnace processing.


HEATPULSE 610 Key Features Include


  • Closed-loop temperature control with pyrometer or thermocouple temperature sensing.
  • Precise time-temperature profiles tailored to suit specific process requirements.
  • Fast heating and cooling rates unobtainable in conventional technologies.
  • Consistent wafer-to-wafer process cycle repeatability.
  • Elimination of external contamination.
  • Small footprint and energy efficiency.


HEATPULSE 610 Performance Specifications


  • Recommended Steady State Temperature Range: 400-1250° C.
  • Steady-State Temperature Stability: ± 2° C.
  • Temperature Monitoring Mechanisms: Extended Range Pyrometer (ERP), used throughout the recommended temperature range, or a thermocouple, used for process temperatures below 400° C.
  • Heating Rate: 1-200° C per second, user-controllable.
  • Cooling Rate: Temperature dependent; max 150° C per second.
  • Maximum Non-uniformity:
  • ±5°C across a 6″ (150mm) wafer at 1150°C. (This is a one sigma deviation 100 angstrom oxide.) For a titanium silicidation process, no more than 4% increase in non-uniformity during the first anneal at 650°C to 700 °C.
  • Post-anneal sheet resistivity measured on a 150mm wafer annealed at 1100° C for 10 seconds. R&D models optimized for slip control.
  • Implant: As 1E16 50 KeV with implant uniformity ≤0.3%
  • Lamp Life: Unconditionally guaranteed for three years.
  • Steady State Time: 1-9999 sec. (1-600 sec. recommended)
  • Wafer Sizes for the HEATPULSE 610: 2″, 3″, 4″, 5″ and 6″.
  • Process Gases: The HEATPULSE system delivers one non-corrosive process gas with manually controlled flow. Two process gas inputs installed.

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