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Equipment Details

Inventory Number: 62871
Category: Plasma Etchers - Ashers - Ion Mills
Manufacturer: Anatech

Anatech SP100 Table Top Plasma System. For plasma cleaning of small parts or for modifying surfaces. Digital countdown timer. Analog pressure display. Gas flow with needle valve control. RF Power Source: 100W at 13.56 MHz. Quartz Chamber: 4 in. x 8 in. Includes vacuum pump. 110V, 60 Hz, 10A.

Now (USD): $9,500.00

Products Similar to: Anatech SP100

Used March Instruments PX 1000E8

Inventory Number: 58786
Now (USD): $21,500.00

March Instruments PX 1000E8 Plasma Asher/Etcher with Pneumatic Vertical Door. Batch system for plasma cleaning or etching. Currently configured with vertical shelves: 18 in. x 6 in. RFX 600 13.56 MHz RF generator. Two gas inputs. Does not include vacuum pump at this price, additional cost depending on type required. Shelves are mounted vertically from top to bottom. Not standard horizontal mounting.

Product Details

Used Plasmatherm SLR 720/720

Inventory Number: 64538
Now (USD): $35,000.00

Plasmatherm SLR-720/720 Dual Chamber RIE Reactive Ion Etch System. PC controller with graphical user interface. Dual chamber unit with robot loader. Was lasted used to process 4" wafers. RF5S 500W, 13.56 MHz RF Generator. Comes with a Turbo pump but does not come with roughing pump. Currently confi gured with nine MFC. 208V, 3 Ph, 60 Hz. Sold as is where is untested at this price.

Product Details

Used PVA TEPLA ION 100/40Q wb

Inventory Number: 64568
Now (USD): $25,000.00

PVA TEPLA ION 100/40Q WB Plasma Barrel Asher. Quartz Barrel photoresist asher and plasma surface treatment system. The Photoresist Ashing IoN 100-40Q Plasma System is a barrel plasma reactor designed for high volume production applications.

Features include:

  • Plug and play self installation
  • Industrial computer with LCD touch panel and keyboard. Windows based operating system.
  • Graphical User Interface (GUI) software complies with CFR Title 21 Part 11 and Semi E95-1101
  • Multi-level of user access
  • Software
    • Recipe editor for fast and versatile step controls
    • Onboard diagnostic features and alarm logging
    • Remote process monitoring via Ethernet
    • Process Chamber

      Material: Quartz chamber
      Dimensions: 304 mm D x 508 mm L (12”X20”)
      Volume: 37 L (1.31 ft3)
      Chamber Opening: 289.56 mm (11.4”)
      Electrodes: Clam-shell
      Number of MFCs: 3
      Process Pressure: (0.16 to 2.66) mbar (120 to 2000) mTorr
      Base Pressure: 0.07 mbar (50 mTorr)
      Pumping Time: 1 min (Pump dependent)
      Wafer Sizes: Up to 200 mm (8”) Batch size (Boat):
      25 wafers of diameter 200 mm (8”)
      50 wafers of diameter 150 mm (6”)
      Wafer Loading: Manual
      Plasma Source Frequency/power: 13.56 MHz/600 W

    • 230V, 1Ph, 50/60Hz, 10A, CE

Product Details