Used Honle UVASPOT 400T

Thermo Oriel Accudose 9000 Photospeed Tool. Measures batch to batch photospeed variations. Photoresist testing system. Oriel part 83995 near UV system with fast shutter. Assures that exposure dosage is in-line with your process window requirements. No need to sideline your expensive stepper for photoresist testing. Provides accurate, incremented bulk area exposures across a wafer. Use it to quantify threshold exposure, spectra variations, find potential resist problems and verify lot to lot consistency.

Karl Suss MJB3 Standard Mask Aligner. System capable of exposing partial wafers or substrates up to a maximum size of 3 in. dia. Ask salesperson about available chucks and sizes. Hard or soft contact modes. 365nm to 400nm spectrum of a 200W high pressure arc lamp. Alignment optics consist of normal field microscope with objective turret for different magnifications. 110V, 60 Hz.

Karl Suss MJB3 Mask Aligner. Has backside capability but no IR chuck with unit. Working condition unknown. Sold As Is.

Oriel 87437-1000 UV Flood Exposure System. 500W UV lamp housing operating in the 350 to 450nm spectral region. Beam Size: 8” x 8”. 200-500W Hg arc lamp power supply. System needs new power supply and electronics inside tower. Needs controller upgrade.

AB-M Mask Aligner and UV Exposure System. 350W lamp housing with power supply, currently configure with 200W bulb. Precision alignment stage.
Mask Holder: 4” x 4” with 3” diameter substrate holder. Chuck and mask holder available for 2" substrates also. System will not do larger substrates.
Exposure timer. Splitfield Zeiss microscope for easier alignment. 120V, 50/60 Hz.

UVOCS T10X10 UV Ozone Cleaner. Organic contamination removal accomplished by the combination of ultaviolet light and ozone. Source Size: 10” x 10”. Active Area: 100 square inches. 110V, 60 Hz, 2.5A

ABM High Performance Tabletop Deep UV Mask Alignment and DUV Exposure System. Table top mask aligner. Adjustable vacuum contact or proximity printing. Precision alignment module for piece parts up to 4” maximum, currently configured with a 100mm diameter chuck. Different sizes available at additional price. Uniform collimated exposure beam, final lens diameter is 6.5”. Wavelength: 220nm. 500W power supply. Dual cameras for alignment. 120V, 50/60 Hz.

SEN LIGHTS CORP. PL17-110E Desktop UV Ozone Cleaning System. Manual Shutter.

• Model number: PL17-110
• Body (internal manual shutter)
• Size (mm): 300 x 290 x 310
• Ultraviolet rays wavelength: 254nm
• Ultraviolet rays illuminance: 15mW/cm2
• Irradiation distance: 20 - 75mm
• Light source side, sample pedestal size: 160 x 160mm

Heraeus LC6B Benchtop Conveyor UV Curing System. Production UV curing unit that is suitable for laboratory and R&D applications. Can handle a variety of substrates up to 7.5” with an effective curing width up to 6”.  Lamp and housing are adjustable to accommodate parts up to 3” H. Usesair flowing through the belt to provide cooling and to help keep small parts in place throughout the curing process. Belt Speed 3.3 to 23 ft/Min. Lamp Supply- 208V, 1 Ph, 50/60 Hz, CE. 115V for Belt Unit, CE. VERY NICE CONDITION!