Equipment Photos

Equipment Details

Inventory Number: 64542
Category: Cleaning Systems
Manufacturer: UVOCS

UVOCS T10X10-OES Ultra Violet Ozone Cleaning System. UV/Ozone cleaning process provides a simple, inexpensive, fast method of obtaining ultra-clean surfaces free of organic contaminants on most inorganic surfaces, such as quartz, silicon, gold, nickel, aluminum, gallium, arsenide, alumina†, etc.  The process is ideal when thin film deposition with excellent adhesion to the substrate is required.  Ultra-clean surfaces can easily be achieved by UV/Ozone processing in one to several minutes after the substrate has been cleaned by conventional techniques. Active Area: 100” squared. Sliding parts tray height to 1.5”. Lamp units 245nm UV. Digital controller. 115V, 60 Hz, 2.5A

Now (USD): $3,500.00

Products Similar to: UVOCS T10X10/OES

Used UVOCS T10X10/OES

Inventory Number: 64961
Now (USD): $3,500.00

UVOCS T10X10-OES Ultra Violet Ozone Cleaning System. UV/Ozone cleaning process provides a simple, inexpensive, fast method of obtaining ultra-clean surfaces free of organic contaminants on most inorganic surfaces, such as quartz, silicon, gold, nickel, aluminum, gallium, arsenide, alumina†, etc.  The process is ideal when thin film deposition with excellent adhesion to the substrate is required.  Ultra-clean surfaces can easily be achieved by UV/Ozone processing in one to several minutes after the substrate has been cleaned by conventional techniques. Active Area: 100” squared. Sliding parts tray height to 1.5”. Lamp units 245nm UV. Digital controller. 115V, 60 Hz, 2.5A

Product Details

Used EDC 100

Inventory Number: 51023
Now (USD): $2,500.00

EDC 100 Exclusive Design Co. Rigid Disk Cleaning System. Uses brushes and surfactant to scrub disks. LCD display. Analog control of scrub/rinse speed and spin dry speed. 115V, 60 Hz.

Product Details

Used UVP PR-100

Inventory Number: 64544
Now (USD): $1,500.00

UVP PR-100 Ozone Surface Cleaner A photochemical interaction occurs in an atmosphere of ultraviolet radiation and ambient air that generates ozone. As the molecules of an organic contaminant become active under ultraviolet radiation they dissociate. The organic contaminants then decompose into harmless volatile gases such as carbon dioxide. The PR-100 produces surfaces meticulously free of contamination. Chamber: 111/8” x 11 5/8” x 3 1/8”.

Product Details

Used STI 870

Inventory Number: 64582
Now (USD): $8,500.00

Semitool STI 870 Spin Rinser Dryer Double Stack. 6” Wafer Rotor in the top spinner and a 4" Rotor in the bottom spinner. High performance cleaning, rinsing and drying system for 25 wafer batch cassette. This system is capable of cleaning substrates from 2” to 6” round if the correct Rotor is installed for that wafer size. On axis orientation keeps wafers parallel allowing DI water manifolds to spray both sides of product continuously and simultaneously. Built in resistivity monitor. 120V, 50/60 Hz,

Product Details

Used STI ST-260

Inventory Number: 64585
Now (USD): $2,950.00

Semitool STI ST 260 Spin Rinser Dryer. High performance cleaning, rinsing and drying system for 25 wafer batch cassette. Currently configured with Rotor for 2” wafers. This system is capable of cleaning substrates from 2” to 5” round if the correct Rotor is installed for that wafer size. On axis orientation keeps wafers parallel allowing DI water manifolds to spray both sides of product continuously and simultaneously. Built in resistivity monitor. 120V, 50/60 Hz,

Product Details

Used UVOCS T16X16/OES

Inventory Number: 64652
Now (USD): $4,950.00

UVOCS T16X16/OES Ultraviolet Ozone Cleaning System. Cleaning or oxidation with the UVOCS is accomplished by the combination of ultraviolet light and ozone.  Low pressure quartz-mercury vapor lamp which generates UV emissions in the 254 and 185 nanometer range.  Source Size: 16” x 16”. Active Area: 256 sq. in. Width: 20”. Depth: 29¾”. Height: 14½ ”. 110 V, 60 Hz, 5.0A

Product Details

Used Jelight 144AX

Inventory Number: 64893
Now (USD): $4,950.00

Jelight 144AX UV Ozone Cleaner. UVO cleaning method is a photo-sensitized oxidation process in which the contaminant molecules of photoresists, resins, human skin oils, cleaning solvent residues, silicone oils and flux are excited and/or dissociated by the absorption of short wavelength UV radiation. Tray Size: 12” x 12” x 3”. 120V, 60 Hz, 5A. CE

Product Details

Used Branson B950R

Inventory Number: 64827
Now (USD): $25,000.00

Branson B950R Ultrasonic Vapor Degreaser is the latest in a series of environmentally sound, cost effective precision degreasers. The B-Series is designed to comply with EPA environmental regulations on solvent emissions, an important environmental and economic consideration.

Features

  • Freeboard ratio of greater than 124% to eliminate diffusion losses
  • Refrigerated primary condensing coil to condense the bulk of the solvent vapors
  • Refrigerated sub-zero freeboard condenser to provide a cold air barrier minimizing fugitive losses
  • Sliding cover to eliminate drafts and help seal the unit during periods of inactivity.
  • Offset boiling sump with liquid level control
  • Bag filter to minimize solvent loss during maintenance
  • Cooled internal water separator to reduce losses
  • Stainless plumbing for solvent-wetted areas
  • Includes optional Automated hoist system with automated lid.
  • 40 Khz Ultrasonics

Specifications

 Solvent capacity 26 gallons
Working dimensions 12" x 16" x 12"D
Watts of Immersion Heat 4000 watts
Distillation rate 14 gph
Load capacity 400lbs.steel/hr
Vapor zone 32.7"L X 19.2"W X 12"D
Input power 230V 3 phase 40A

Product Details

Used Baron Blakeslee LAB KLEEN LK 612S

Inventory Number: 64925
Now (USD): $8,500.00

Baron Blakeslee Lab Kleen LK 612S Tabletop Precision Ultrasonic Vapor Degreaser. This complete cleaning system consists of electrical heating, refrigerated cooling, ultrasonics and all of the necessary safety controls.

•Immersion Vapor Degreaser
•For Small Cleaning Requirements
•Compact Form, Bench Top Style
•For Use With Nonflammable Fluorinated Hydrocarbon
Cleaning Solvents
•Optional Ultrasonics

•Ideal For Cellular, Electronics, Medical, Micro Machining
Applications•

Tank Dimensions: 12” Long x 6” Wide x 6” Deep
• Heat Input: 1,000 watts
• Power Supply 120 VAC-1Ph-60Hz
• Refrigeration Unit: Air Cooled (¼ HP)
• Thermal Capacity Per Hour: 5 Pounds Of Steel
• Distillation Rate: 2 GPH
• Total Operational Solvent Fill Amount: 4 Gallons



Product Details

Used OEM GROUP 470S

Inventory Number: 64950
Now (USD): $6,950.00

OEM Group 470S SRD High Performance Spin Rinse Dryer Wafer Cleaner. The SRD is a 25 wafer, batch size, single or dual chamber tool. This proven design has demonstrated uptime of 95%. Introduced in 1979, over 25,000 SRD units have shipped worldwide. Spray on axis orientation allows uniform spray onto the wafers. Clean / Rinse built-in resistivity monitoring assures an automatic and reliable clean; the process chamber is cleaned with the product; quick ramp S model brushless DC motor provides economy and efficiency. Dry centrifugal drying, coupled with heated nitrogen and a lowpressure nitrogen purge through a heated process chamber. Flexible Fast easy to change rotors for simple re-configuration to match any array of applications’ wafers. Currently configured with single bolt rotor for 6" x 6" squares. 120V, 50/60Hz, 15A

Product Details