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Cleaning Systems

Used K&S 973

Inventory Number: 54734
Now (USD): $9,500.00

High Pressure Microwash Substrate Cleaning System. For sawed/scribed wafers or photomask cleaning. Utilizes an oscillating high pressure deionized water jet spray of up to 2000 psi with 0.2 micron filtration. Handles wafers up to 8 in. dia. depending on type of chuck installed. Touch screen operation. CO2 reionizer for elimination of static charge. Nitrogen dry. Infrared heat lamp. 115V, 50/60 Hz, 6A.

Product Details

Used K&S 973

Inventory Number: 60251
Now (USD): $9,500.00

High Pressure Microwash Substrate Cleaning System. For sawed/scribed wafers or photomask cleaning. Utilizes an oscillating high pressure deionized water jet spray of up to 2000 psi with 0.2 micron filtration. Handles wafers up to 8 in. dia. depending on type of chuck installed. Touch screen operation. CO2 reionizer for elimination of static charge. Nitrogen dry. Infrared heat lamp. 115V, 50/60 Hz, 6A.

Product Details

Used K&S 971

Inventory Number: 60926
Now (USD): $7,950.00

MicroWash Wafer Cleaning Station. Handles up to 8 in. wafers. System utilizes a high pressure deionized water spray. Rapid drying feature combines variable speeds with nitrogen assist and heat lamp. 115V, 1 Ph, 60 Hz, 5A.

Product Details

Used Semitool SST614AG

Inventory Number: 57995
Now (USD): $4,950.00

Solvent Chemical Stripping and Developing Tool. Rotor for 6 in. wafers. Programmable controller with 3.5 in. floppy drive. Four liquid storage tanks. 208V, 3 Ph,, 50/60 Hz, 15A. Sold As Is.

Product Details

Used Semitool 2300S72ELH

Inventory Number: 59989
Now (USD): $12,950.00

200mm SRD Spin Rinse Dryer. Single stack front loading SRD. Capable of processing up to 8-inch 200mm wafers. Currently has Model A192-80M-0215 rotor installed. Cleans cassette of wafers using DI water spray as the cassette spins and an N2 drying process. 380V, 3 Ph, 50/60 Hz, 16A, CE. Year of Mfg.: 2008.

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Used Semitool STI PA72-40MB-0603

Inventory Number: 44013
Now (USD): $950.00

Semitool 4 in. Single Bolt Rotor.

Product Details

Used Semitool STI 860

Inventory Number: 56202
Now (USD): $8,500.00

Spin Rinse Dryer for Wafer Cleaning. Currently configured with rotors for 4 in. dia. wafers. Two rinser dryers stacked in one roll around cabinet. Unit does not have resistivity monitors. 120V, 60 Hz.

Product Details

Used Semitool STI 860

Inventory Number: 56262
Now (USD): $9,500.00

Spin Rinse Dryer for Wafer Cleaning. Cleans wafers with DI water and nitrogen drying. Currently configured for 4 in. wafer cassettes. Top and bottom units operate independent of each other. Resistivity monitor. 120V, 60 Hz.

Product Details

Used Semitool STI 870

Inventory Number: 57642
Now (USD): $11,000.00

Dual Stack Spin Rinse Dryer. High performance wafer cleaning system. Currently configured with rotors for 4 in. wafer cassettes. Used DI water spray to rinse wafers as they spin and uses nitrogen to dry wafers. 120V, 60 Hz.

Product Details

Used Semitool STI 870ST

Inventory Number: 58333
Now (USD): $11,000.00

Spin Rinse Dryer for Wafer or Substrate Cleaning. Spin rinser dryer dry to dry system with on-axis horizontal rotor. System uses DI water spray and heated N2 to clean substrates as a full cassette rotates inside chamber. Currently configured with rotors for 5 in. wafer cassettes. Size can be changed for additional charge. 328 style controllers. Unit does not have resistivity monitors. 120V, 50/60 Hz.

Product Details