Category Feed Subscribe to this Channel's RSS Feed

Cleaning Systems

Used EDC 100

Inventory Number: 51023
Now (USD): $2,500.00

Exclusive Design Co. Rigid Disk Cleaning System. Uses brushes and surfactant to scrub disks. LCD display. Analog control of scrub/rinse speed and spin dry speed. 115V, 60 Hz.

Product Details

Used Global Processing MASP TTTT

Inventory Number: 46882
Now (USD): $8,500.00

4 Inlet Thermal Oxide Scrubber.

Product Details

Used Jelight 256

Inventory Number: 60979
Now (USD): $8,500.00

UV Ozone Cleaner. Produces near atomically clean surfaces in less than one minute. Cleaning Tray Size: 16 in. x 16 in. Switchable dual media. Ozone killer not included, does not come with this option. 120V, 60 Hz, 10A, CE.

Product Details

Used Jelight 256

Inventory Number: 61074
Now (USD): $8,500.00

UV Ozone Cleaner. Produces near atomically clean surfaces in less than one minute. Cleaning Tray Size: 16 in. x 16 in. Switchable dual media. Ozone killer not included, does not come with this option. 120V, 60 Hz, 10A, CE.

Product Details

Used Jelight 576 W-4 inch

Inventory Number: 62863
Now (USD): $15,000.00

Large Area UVO Cleaning System for Ultraviolet and Ozone Processing of Substrates. Safest and most effective method of removing organic contaminants from silicon, gallium arsenide, quartz, sapphire, glass, mica, ceramics, metals and conductive polyimide cements. Tray Dimensions: 24 in. W x 24 in. L. Digital controller. 125V, 60 Hz, 20A.

Product Details

Used K&S 973

Inventory Number: 54710
Now (USD): $9,500.00

High Pressure Microwash Substrate Cleaning System. For sawed/scribed wafers or photomask cleaning. Utilizes an oscillating high pressure deionized water jet spray of up to 2000 psi with 0.2 micron filtration. Handles wafers up to 8 in. dia. depending on type of chuck installed. Touch screen operation. CO2 reionizer for elimination of static charge. Nitrogen dry. Infrared heat lamp. 115V, 50/60 Hz, 6A.

Product Details

Used K&S 973

Inventory Number: 54734
Now (USD): $9,500.00

High Pressure Microwash Substrate Cleaning System. For sawed/scribed wafers or photomask cleaning. Utilizes an oscillating high pressure deionized water jet spray of up to 2000 psi with 0.2 micron filtration. Handles wafers up to 8 in. dia. depending on type of chuck installed. Touch screen operation. CO2 reionizer for elimination of static charge. Nitrogen dry. Infrared heat lamp. 115V, 50/60 Hz, 6A.

Product Details

Used Layton Technologies IMMASYS FS2012

Inventory Number: 63094
Now (USD): $6,500.00

IPA Cleaning System. PLC control for process flexibility and ease of use. Stainless steel construction. Bath Area: 27 in. L x 17 in. W x 12 in. D. 208/120V, 3 Ph, 50/60 Hz. Pulled from working environment but we are unable to test. Cooling coil compressor included with unit but will need to add refrigerant. Sold As Is.

Product Details

Used Ozonia CFS-1

Inventory Number: 62579
Now (USD): $3,950.00

Compact Ozone Generator. Ozone Production Oxygen: 10 wt percent 2.91 lb/d. Oxygen Requirement: 24 scfm. Air Requirement: 6 scfm. Ambient Temp.: +5 to 40 deg C. 230V, 1 Ph, 50/60 Hz, 3.4A, CE.

Product Details

Used Ozonia CFS-1

Inventory Number: 62580
Now (USD): $3,950.00

Compact Ozone Generator. Ozone Production Oxygen: 10 wt percent 2.91 lb/d. Oxygen Requirement: 24 scfm. Air Requirement: 6 scfm. Ambient Temp.: +5 to 40 deg C. 230V, 1 Ph, 50/60 Hz, 3.4A, CE.

Product Details