| Inventory Number: |
65004 |
| Category: |
PECVD - Oxidation |
| Manufacturer: |
Oxford Instruments |
Oxford Instruments OPAL ALD Atomic Layer Deposition System. The Oxford OpAL is a plasma or thermal assisted atomic layer deposition system ALD. It is an open loop (non-loadlocked) tool which had two channels for metal organic precursors, one channe1 for water and a plasma head.
System Overview
Hardware Details
- Single open-loop vacuum chamber with heated table and heated sidewalls
- 8.25" Heated table can run 80-300ºC
- Downstream 300 W RF plasma head with isolation valve
- Software to run loops of dose/purge cycles to enable ALD
Substrate Requirements
- 8.25" Diameter circular, flat table.
- Substrates must be able to handle 100-250C heating depending on process.
- Due to aggressive pumping/purging very small samples or powders not recommended.
- 208V, 3Ph, 60Hz, 25A
Retail (USD): $59,000.00
Now (USD): $59,000.00