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Oxford Instruments

Used Oxford Instruments Plasmalab 800 Plus PECVD

Inventory Number: 60810
Now (USD): $99,000.00

Large Capacity Open Loaded Plasma Enhanced Chemical Vapor Deposition System. A 460mm diameter electrode offers a capacity of up to twelve 4 in. wafers. Ideally suited for batch PECVD processing where excellent across chamber uniformity of less than 2 percent is achieved for silicon nitride and silicon dioxide layers. Last owner had set up for 2 in. wafers. 18.75 in. top electrode with shower head gas input. Footprint is kept to a minimum by locating all electronics and vacuum components within the body of the tool, mass flow controllers are housed separately in a wall mounted gas pod. Six MFC gas controllers, previously used gases He, N2, N2O, NH3, SIH4/N2, CF4. PC controller provides intuitive user interaction with the system via advanced graphics and process recipe pages. Includes vacuum pump and blower package. Mfg. 2009, nice condition.

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Used Oxford Instruments Plasmalab 180 ICP

Inventory Number: 62276
Now (USD): $99,000.00

ICP Inductively Coupled Plasma High Density Etching System. The Plasmalab System 100 ICP 180 is a load locked plasma etching system configured for reactive ion etching with ICP (Inductively Coupled Plasma) source. The system control is done by computer which provides fully automatic operation. Maximum substrate size 150 mm, currently configured for 100 mm wafers. Chuck type mechanical clamping. Backside helium cooling. Alcatel turbo pump with controller and roughing pump. Gas box with six MFC gas controllers. Previously used gases CHF3/CHF4, C3F8, C4F8, Argon, Oxygen, Hydrogen, Chlorine. 208V, 3 Ph, 50/60 Hz.

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Used Oxford Instruments 90 Plus RIE

Inventory Number: 62737
Now (USD): $69,000.00

RIE Reactive Etcher with Loadlock. Small batch load-locked RIE with 275 mm electrode. Easy to use computer interface controls all system functions. 13.56 MHz RF generator, 600W. Gas box with four MFC. Previous gases used: Oxygen, Boron Trichloride, Chlorine and Nitrogen. Includes roughing pump.

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Used Oxford Instruments Plasmalab 80 Plus RIE

Inventory Number: 62752
Now (USD): $15,000.00

Plasma System.  RF matching network mounted on top of chamber. ENI ACG-3 13.56 MHz 300W RF generator. 6-inch diameter platen. Does not include vacuum pump. 208V, 3 Ph, 50/60 Hz, CE. Sold As Is.

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