Inventory Number: 58938
Rapid Thermal Processing Batch Furnace. Digital controllers. Ambient to 1200 deg C. Quartz Chamber: 8 in. ID x 24 in. D. Automatic door assembly, double O-Ring vacuum sealed. 208V, 3 Ph, 60 Hz. Furnace only. No addition: Quartzware or vacuum pump.
Inventory Number: 60678
Benchtop RTP Rapid Thermal Processor. Benchtop system for rapid thermal processing of semiconductor wafers up to 6 in. dia. max. (Depends on wafer tray with system). Programmable ramp up rates. Peak Temp.: 1350 deg C. Recommended Steady State Temp. Range: 400 to 1150 deg C. 208V, 1 Ph, 60 Hz, 90A.
Inventory Number: 61568
Rapid Thermal Processing System with Vacuum Chamber. PC controller. Temperature measurement control system provides accurate and repeatable thermal control across the temperature range. Temperatures up to 1300 deg C. Multi-zone halogen lamp furnace. Ramp Rate: 1 deg C/s to 400 deg C/s. Max. Substrate Size: 6 in. dia. Process gas lines. Includes roughing pump. 220V, 3 Ph, 50/60 Hz, 100A, CE. Unit will be tested for an accuracy of +/-5 deg C from setpoint.