Denton Vacuum Explorer 14 2 Target RF Sputtering System

Graphic user interface and touch screen control. The system is fully automatic or can be run manually. Features a box coater design that provides easy access to substrates, sources, and instrumentation while maintaining excellent pumping characteristics. System utilizes a Turbo high vacuum pump and roughing pump. Two RF magnification cathodes each with a shutter. Variable source to substrate distance. Cathodes are mounted confocally for sputter down.  Cathode size
is approximately 3” dia. Rotating substrate holder 6” diameter. Unit is configured with quartz substrate heater option. Unit also includes MKS gas controller with two MFCs. Deposition chamber 14” H x14” W x 14” D stainless construction. 208V, 1Ph, 50/60Hz