Equipment Photos

Equipment Details

Inventory Number: 62604
Category: PECVD - Oxidation
Manufacturer: Plasmatherm

PECVD Plasma Enhanced Chemical Vapor Deposition System. Load locked parallel plate PECVD system. Windows graphical user interface provides an easy and familiar environment for machine operation and control. The top electrode is RF powered and the substrate is temperature controlled. Gas box is configured with eight gas input lines controlled by MFC. Previously used the following gases: CF4, SF6, AR, HE, NH3, Silane, N2O, SiN, N2. Includes Neslab chiller, roughing pump and power box.

Now (USD): $59,000.00

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Product Details

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Product Details

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Product Details

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Product Details

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Product Details

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