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Inventory Number: 58884
Category: PECVD - Oxidation
Manufacturer: Plasmatherm Unaxis

ICP Plasma Etch System. Inductively coupled plasma etching system for high etch rates and control over selectivity and damage. PC controller with graphical user interface. 9.5 in. bottom electrode, ceramic clamp currently for 2 in. wafer. Chamber pumped via turbo pump with rough pump. RF Generators: RFPP5S 500W, 13.56 MHz and RFPP10M 1000W, 2 MHz. Six MFC mass flow gas controllers. Previous Gases used: CL2, SF6, N2, CF4, AR, BCL3.

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Products Similar to: Plasmatherm Unaxis 790

Used Plasmatherm 790 6-inch RIE

Inventory Number: 55594
Now (USD): Contact for Price

THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR PLASMA THERM SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL. * * * * * * * * * * * * * * * * * * * * * * * * * * Reactive Ion Etcher. Computer controlled plasma processing tool. Substrate electrode 7 in. dia. holds a 6 in. wafer. Shower head gas introduction. 500W, 13.56 MHz RF generator. Turbo pumped vacuum system. Includes roughing pump. 7 gas inputs controlled via MFC. 208V, 3 Ph, 60 Hz.

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Used Headway Research PWM32-PS-R790

Inventory Number: 60114
Now (USD): $3,950.00

Photoresist Spinner with Digital Programmable Controller. Mounted in a Headway cabinet. Up to 10,000 rpm for relatively light loads such as silicon wafers, small photomasks. Maximum substrate size up to 5-inch. Does not have dispense pumps or lines. Will need vacuum source for wafer hold-down. 120V, 60 Hz.

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Used Headway Research PWM32-PS-R790

Inventory Number: 60113
Now (USD): $3,950.00

Photoresist Spinner with Digital Programmable Controller. Mounted in a Headway cabinet. Up to 10,000 rpm for relatively light loads such as silicon wafers, small photomasks. Maximum substrate size up to 5-inch. Does not have dispense pumps or lines. Will need vacuum source for wafer hold-down. 120V, 60 Hz.

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Used Plasmatherm 790 MF

Inventory Number: 60293
Now (USD): $49,000.00

Plasma RIE Reactive Ion Etch System. PC controlled plasma etching system. Single process chamber with shower head style gas input and a 7 in. dia. platen. 500W, 13.56 MHz RF generator. Five MFC gas flow channels, previous gases used: HC-23, N2, 02, SF6. Roughing pump with blower. Does not include water chiller.

Product Details

Used Plasmatherm 790 6-inch RIE

Inventory Number: 60479
Now (USD): $42,500.00

Single Chamber Plasma RIE Reactive Ion Etching System. Plasma Therm plasma processing system for single substrates up to 150mm dia. Parallel plate plasma processing with shower head gas delivery system. Six MFC gas channels. Previous Gases: AR, N2, O2, SF6, CHF3, CF4. Easy menu driven process programming. Turbo pumped vacuum system with roughing pump. 500W 13.56 MHz RF generator with matching network.

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Used Headway Research PWM32-R790

Inventory Number: 61325
Now (USD): $5,250.00

Photoresist Spinner Mounted in Exhaust Hood Table. Spin coater for substrates up to 5 in. diameter or diagonal. The bowl diameter is 7.9 in. ID. Up to 10,000 rpm for relatively light loads such as silicon wafers or small photomasks. Two HDP98 pump fluid dispensers included at no additional price but these are not tested or part of warranty. PWM32 digital controller. Unit is mounted on a table with a stainless fume hood. 120V, 50/60 Hz, 10A.

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Used Aviza Process Module

Inventory Number: 55576
Now (USD): $10,000.00

Oxide Process Module for Nano-ALD System. Process module only, no pumps. 300mm. Sold not tested with 30 day right to return.

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Used Aviza NANO-ALD

Inventory Number: 55443
Now (USD): $19,000.00

Brooks Automation Gemini Express Vacuum Cluster Tool Integration Platform. No vacuum pumps included. Removed from service, nice condition. Sold not tested with 30 day right to return.

Product Details

Used Aviza AL203

Inventory Number: 55593
Now (USD): $10,000.00

Process Module for Nano-ALD System. Process module only, no pumps. 300mm. Sold not tested with 30 day right to return.

Product Details

Used Oxford Instruments Plasmalab 800 Plus PECVD

Inventory Number: 60810
Now (USD): $99,000.00

Large Capacity Open Loaded Plasma Enhanced Chemical Vapor Deposition System. A 460mm diameter electrode offers a capacity of up to twelve 4 in. wafers. Ideally suited for batch PECVD processing where excellent across chamber uniformity of less than 2 percent is achieved for silicon nitride and silicon dioxide layers. Last owner had set up for 2 in. wafers. 18.75 in. top electrode with shower head gas input. Footprint is kept to a minimum by locating all electronics and vacuum components within the body of the tool, mass flow controllers are housed separately in a wall mounted gas pod. Six MFC gas controllers, previously used gases He, N2, N2O, NH3, SIH4/N2, CF4. PC controller provides intuitive user interaction with the system via advanced graphics and process recipe pages. Includes vacuum pump and blower package. Mfg. 2009, nice condition.

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