Equipment Photos

Equipment Details

Inventory Number: 42576
Category: Photoresist: Coaters - Tracks
Manufacturer: FAS Technologies

FAS Technologies MicroE™ 200 Extrusion Coating System. Uses high precision extrusion technology to coat materials in a wide range of viscosities. Coats very thick layers (100 micrometers) in a single step. Repeatable digitally programmed process. Greater material utilization than spin coating (typical 75 percent of dispensed material remains on the wafer). Sold As Is.

Now (USD): $5,000.00

Products Similar to: FAS Technologies MicroE™ 200

Used FAS Technologies MicroE™ 200

Inventory Number: 42901
Now (USD): $39,000.00

FAS Technologies MicroE™ 200 Cassette to Cassette Extrusion Coating System with Stacked Bake/Chill Oven. System is capable of coatings over 100 micron thick in one process step with uniformities surpassing +/- 2 percent. Material utilization is 75 percent compared to 5-10 percent for spin coating. This means lower cost of material and reduced expense of waste disposal. Increased process uniformity. Uses high precision extrusion technology. Ability to coat materials in a wide range of viscosities. Repeatable digitally programmed process. With Genmark Mini Max Gencobot 7S/3L Handler. Model JS-9940 stacked bake unit with 3 ovens.

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Used Ultrasonic Systems P450-1-151

Inventory Number: 57083
Now (USD): $25,000.00

Ultrasonic Systems P450-1-151 Selective Coating System. Programmable selective coating system for precise application of a wide range of materials for the semiconductor, electronics, medical and industrial markets. Features Ultra-Spray technology which enables more accurate, thinner coating applications than conventional spray and dispensing technology. Currently configured with CAT ILDS head. Conveyor system. Graphical user interface. 115V, 50/60 Hz, 13A, CE.

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Used SVG 8632CTD/8636HPO

Inventory Number: 41192
Now (USD): $21,500.00

SVG Site Services 8632CTD/8636HPO Developer-Exposure Track. Single track developer configured with 2 elevators, one spinner and one bake. System has an OAI 0130-042-20 deep UV. 220 nanometer exposure tower capable of up to 2000W. Currently configured for 4 in. wafers.

Product Details

Used FAS Technologies MicroE™ 200

Inventory Number: 42901
Now (USD): $39,000.00

FAS Technologies MicroE™ 200 Cassette to Cassette Extrusion Coating System with Stacked Bake/Chill Oven. System is capable of coatings over 100 micron thick in one process step with uniformities surpassing +/- 2 percent. Material utilization is 75 percent compared to 5-10 percent for spin coating. This means lower cost of material and reduced expense of waste disposal. Increased process uniformity. Uses high precision extrusion technology. Ability to coat materials in a wide range of viscosities. Repeatable digitally programmed process. With Genmark Mini Max Gencobot 7S/3L Handler. Model JS-9940 stacked bake unit with 3 ovens.

Product Details

Used Solitec OptiTrac

Inventory Number: 51544
Now (USD): $25,000.00

Solitec OptiTrac Photoresist Developer. Cassette to cassette photoresist developer. Single spin develop module, 2 bake cool modules. PC controller. Small cleanroom footprint. User friendly software.

Product Details

Used Ultrasonic Systems P450

Inventory Number: 57148
Now (USD): $19,500.00

Ultrasonic Systems P450 Selective Coating System. Programmable selective coating system for the precise application of a wide range of materials for the semiconductor, electronics, medical and industrial markets. Features Ultra-Spray ultrasonic coating head which enables accurate thinner coating application than conventional spray and dispensing technology. Currently configured with Ultra-Spray CAT 35 ILDS head. Cartridge dispense system. Conveyor system. Graphical user interface. 120V, 50/60 Hz, 13A.

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Used Headway Research PWM32-PS-R790

Inventory Number: 60114
Now (USD): $3,950.00

Headway Research PWM32-PS-R790 Photoresist Spinner with Digital Programmable Controller. Mounted in a Headway cabinet. Up to 10,000 rpm for relatively light loads such as silicon wafers, small photomasks. Maximum substrate size up to 5-inch. Does not have dispense pumps or lines. Will need vacuum source for wafer hold-down. 120V, 60 Hz.

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Inventory Number: 60386
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Laurell WS-500-8TFM WS-500 Series Spin Processor Developing Station for up to 200mm Wafers. Process spinner. For cleaning, etching, developing processes on wafers up to 200mm. Features a locked, counter balanced, clear dome chamber for a protected view of the process without exposure to vapors or chemicals. Mounted in a Bettcher RA36FRPP wet bench. Up to 20 fifty step programs can be stored in the controller. 120V, 60 Hz.

Product Details

Used Solitec 5110 (8mm)

Inventory Number: 60427
Now (USD): $4,500.00

Solitec 5110 (8mm) Photoresist Coater Developer. Does not include resist dispense pumps or parts. Manual load photoresist spinner. Programmed cycle times. Acceleration variable from 1,000 to 40,000 rpm/sec. Speed adjustable from 200 to 10,000 rpm. Digital tachometer. Process sequence resist, spread, spin. Can accommodate substrates up to 9 in. round or 6 in. square. 115V, 60 Hz.

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Used Karl Suss RC8-MS3

Inventory Number: 60633
Now (USD): $8,500.00

Karl Suss RC8-MS3 Photoresist Spinner. Unique design provides a better uniformity than conventional spin coaters. Reduces resist consumption by up to 50 percent. Fully programmable process parameters. Handles up to 8 in. round substrates. (Depends on chuck installed). 110V, 60 Hz, CE.

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