Used Axic Benchmark 800 ICP

Inventory Number: 61743
Now (USD): $49,000.00

Plasma Enhanced Chemical Vapor Deposition System PECVD. Tool used in research, process development or low volume production for precise etching and deposition on substrates up to 8-inches in diameter. The system can be operated in either a batch or single slice mode. Features single-piece chamber construction, proven process recipes, field proven components, computer control with Windows programming. Previous gases used N2, SF6, He, SiH4, NH3, N2O. Dual Advanced Energy Dressler Cesar RF generators.

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