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Wafer Analysis

Used Inficon XTC/3M

Inventory Number: 62188
Now (USD): $2,950.00

Thin Film Multilayer Deposition Controller. Patented ModeLock technology prevents film thickness errors caused by mode-hopping. Supports Inficon Crystal 12®, CrystalSix®, and dual sensor automatic crystal switching for maximum productivity. XTC/3M multiple-layer model supports up to 99 processes, 999 layers, 32 films, two sensors and two sources. Easy to read TFT LCD graphics display. Comes with two oscillators but no feedthroughs or crystal holders, only what is in photos. 100-230V, 50/60 Hz, CE.

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Used JMAR S2610-01

Inventory Number: 50626
Now (USD): $6,000.00

Non-Contact Automatic 3-Axis Tabletop Measurement System. JMAR Video CMM® software. Supports high magnification microscope optics. Three channel computer controlled light source. X-Y stage travel: 10 in. x 4 in. 115V, 60 Hz. Mfg. 2001.

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Used KLA Tencor AS 500

Inventory Number: 62214
Now (USD): $15,000.00

Stylus Based Surface Profiler. Resolution to 1 angstrom and guaranteed repeatability of 10 angstrom. Accurately measures surface characteristics such as step height, roughness and etch depth on a wide variety of surface substrates. Extremely easy to use. Zoom optics provide magnification up to 210X for precise micro measurements. Stylus force adjustable between 1 and 100mg. Scan Length: 10mm. 115V, 50/60 Hz.

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Used Metricon PC-2000

Inventory Number: 54118
Now (USD): $2,950.00

Thin Film Thickness and Refractive Index Measurement System. Unparalleled accuracy in measurement of thin film thickness, refractive index and bulk refractive index. Prism coupler instrument. 115V, 60 Hz.

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Used Nanometrics 8300X

Inventory Number: 59620
Now (USD): $21,500.00

Thin Film Metrology Tool. Unit gives robot error when powered up. Can accommodate 300mm wafers. Film thickness measurement system. Sold As Is.

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Used Nanometrics Nanospec 6100

Inventory Number: 62025
Now (USD): $39,000.00

Automated Film Thickness Measurement System. Tabletop film thickness measurement and mapping tool. Designed to measure the thickness of films deposited on various substrates including those used in semiconductor and magnetic head fabrication. Uses non-contact spectroreflectometry on sites as small as 10 micrometers. A computer sample stage and a robust autofocus system allows the automatic generation of film thickness uniformity maps. 115V, 50/60 Hz, 5A.

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Used Philips PLM-100

Inventory Number: 48787
Now (USD): $22,500.00

Photoluminescence Mapping Tool. For process control, analysis of band-gap, ternary layer composition, layer thickness and crystal perfection.

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Used Rame Hart 100-00-115

Inventory Number: 62079
Now (USD): $1,500.00

Contact Angle Goniometer. Permits the study of contact angle under ambient temperature and atmosphere. Measures contact between a liquid drop and a solid at room temperature. 120V.

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Used Rudolph Auto El III

Inventory Number: 59156
Now (USD): $4,950.00

Ellipsometer. Displays film thickness, index, order thickness, substrate N and K on transparent films. Max. Sample Size: 6 in. x 6 in. Variable angle of incidence, manual adjust. Single Wavelength: 632.8nm. Null seeking operating principle.

Product Details

Used SSEC M3302

Inventory Number: 60584
Now (USD): $125,000.00

Single Wafer Chemical Etch Processor. • Currently configured for 8 in./200mm. • Mfg. Date: 2013. • Model M3302 - (2) process modules. • Install Type: Through-the-wall (TTW). • CE Marked. • Dry-In / Dry Out Operation. • Factory Interface with mini-environment. • (4) 8 in. (200mm) Cassette Stations. • Automatic Load/Unload. Note: Cassette station No. 3 dedicated to Cu. • Wafer Aligner. • (4) End-effecter Wafer Handling Robot. • Application: BEOL. • Process Module-1: Non-Cu (General Purpose). • Process Module-2: Cu dedicated. • SECS/GEM Interface. • Safety: INTLK/Comm.: H2SO4/H2O2. • INTLK/Comm.: HF. • Facility Requirements: CDA, N2, DIW, HF (10:1), Sulfuric (97 percent), Hydrogen Peroxide (30 percent). • Power: 208VAC, 20A, Single Phase, 60Hz. • Was operational when deinstalled.

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