Power Supplies - RF-Plasma-E-Gun

Neutralizer Power Supply. 208/220V, 1 Ph, 50/60 Hz, 12A, CE.

High Power Modulator.

Programmable Multi-Channel Power Supply Designed for Electroplating Wafers. Output Rating: Forward channel 3A and 10V peak at 33 percent duty cycle into 3.3 ohm. Non-inductive load fed thru 10 feet of 18 awg wire. Output Resolution: Step size at peak current 1mA. Step size at peak voltage 2.5mA. Measurement Resolution: Step size at average current 1mA. Step size at average voltage 2.5mA. Needs Windows PC to control unit.

Ion Source Controller. Sold As Is.

Two RF Generators for Applied Materials Cluster Tool. Previously used on Applied Materials HDP high density plasma chambers. Cannot test without controller. Sold AS IS with 30 day right to return.

20V, 90A DC Power Supply. 120V, 50/60 Hz.  2 Available.

Controller. Links Plasma Generators & Matching Networks to Computers for digital metering and control.

Controller. Links Plasma Generators & Matching Networks to Computers for digital metering and control.

Reactive Sputtering Power Supply. For reactive sputtering processes in which arcing is unavoidable, the low level arc energy and high arc sensitivity have important benefits. System output 20 kW. 380/480V, 3 Ph, 50/60 Hz.

Power Generator. Can supply up to 9000W of power over a frequency range of 8 to 111 kHz. 50 ohm output impedance.