Power Supplies - RF-Plasma-E-Gun

Two RF Generators for Applied Materials Cluster Tool. Previously used on Applied Materials HDP high density plasma chambers. Cannot test without controller. Sold AS IS with 30 day right to return.

20V, 90A DC Power Supply. 120V, 50/60 Hz.  2 Available.

Controller. Links Plasma Generators & Matching Networks to Computers for digital metering and control.

Controller. Links Plasma Generators & Matching Networks to Computers for digital metering and control.

Reactive Sputtering Power Supply. For reactive sputtering processes in which arcing is unavoidable, the low level arc energy and high arc sensitivity have important benefits. System output 20 kW. 380/480V, 3 Ph, 50/60 Hz.

Linear Pulsed Amplifier. Frequency Range: 10 - 86 MHz. Output Power: 1000W. Gain: 60 dB with gain flatness +/-1 dB.

Pulsed Bipolar Power Supply. Power: 3 kW. P/N 260-01. Customer Part No.: 0190-01428. 208V, 3 Ph, 50/60 Hz, 30A, CE.

Pulsed Bipolar Power Supply for Semiconductor Electroplating Applications. Power: 3 kW. Software modified Ver. 1.2 Test A. 208V, 3 Ph, 50/60 Hz, 30A.

Phase Shift Controller. Designed for use with OEM or ACG Series plasma generators. Provides additional flexibility for controlling RF power in plasma etching and sputtering applications at 13.56 MHz. The VL-400 is capable of producing up to three fixed-phase 13.56 MHz outputs and one additional phase shifted output. The phase shifted output can be varied from 0 to 500 degrees with respect to the fixed phase outputs.

100 KHz 50W RF Generator. 50W RF output. Operating Frequency: 100 KHz. Water cooled. 208V, 1 Ph, 60 Hz.