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Photoresist: Coaters - Tracks

Used Karl Suss RC8-MS3

Inventory Number: 60633
Now (USD): $8,500.00

Karl Suss RC8-MS3 Photoresist Spinner. Unique design provides a better uniformity than conventional spin coaters. Reduces resist consumption by up to 50 percent. Fully programmable process parameters. Handles up to 8 in. round substrates. (Depends on chuck installed). 110V, 60 Hz, CE.

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Used Laurell WS-500-8TFM

Inventory Number: 60386
Now (USD): $12,000.00

Laurell WS-500-8TFM WS-500 Series Spin Processor Developing Station for up to 200mm Wafers. Process spinner. For cleaning, etching, developing processes on wafers up to 200mm. Features a locked, counter balanced, clear dome chamber for a protected view of the process without exposure to vapors or chemicals. Mounted in a Bettcher RA36FRPP wet bench. Up to 20 fifty step programs can be stored in the controller. 120V, 60 Hz.

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Used Solitec OptiTrac

Inventory Number: 51544
Now (USD): $25,000.00

Solitec OptiTrac Photoresist Developer. Cassette to cassette photoresist developer. Single spin develop module, 2 bake cool modules. PC controller. Small cleanroom footprint. User friendly software.

Product Details

Used Solitec 5110 (8mm)

Inventory Number: 60427
Now (USD): $4,500.00

Solitec 5110 (8mm) Photoresist Coater Developer. Does not include resist dispense pumps or parts. Manual load photoresist spinner. Programmed cycle times. Acceleration variable from 1,000 to 40,000 rpm/sec. Speed adjustable from 200 to 10,000 rpm. Digital tachometer. Process sequence resist, spread, spin. Can accommodate substrates up to 9 in. round or 6 in. square. 115V, 60 Hz.

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Used Solitec 5110

Inventory Number: 61829
Now (USD): $3,950.00

Solitec 5110 Single Head Wafer Processing Photoresist Spin Coater. Designed to coat wafers, masks and substrates. Simple design for low maintenance easy serviceability and high up-timer. Acceleration 1,000 to 40,000 rpm/sec. Digital display/timer with manual programming. Capable of 9 in. round, 6 in. square or 9 in. diagonal for rectangular substrate. 120V. Does not include resist dispense pump or parts.

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Used Specialty Coating Systems G3-8

Inventory Number: 62968
Now (USD): $3,950.00

Specialty Coating Systems G3-8 Spin Coater. Accurately applies liquid coating materials such as photoresists, polyimides, metallo-organics, dopants and silica films on planar substrates. Single step coating profiles. Coating cycles are interruptible. Rotational Speed: 0 to 9.999 rpm. Dwell Time: 0 to 999 seconds in 1 second increments. 115V, 1 Ph, 60 Hz, CE.

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Used Specialty Coating Systems G3P-12

Inventory Number: 60959
Now (USD): $4,950.00

Specialty Coating Systems G3P-12 Precision Photoresist Spin Coater. Programmable model store and execute up to 30 programs with 20 steps each which are easily entered on the front panel LCD display and keypad. Rotational Speed: 0 to 9,999 rpm. Acceleration: 0.1 to 25.5 sec. 12-inch diameter bowl. 115V, 60 Hz.

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Used Specialty Coating Systems G3P-8

Inventory Number: 63069
Now (USD): $3,950.00

Specialty Coating Systems  G3P-8 Spin Coater. Accurately applies liquid coating materials such as photoresists, polyimides, metallo-organics, dopants and silica films on planar substrates. Single step coating profiles. Coating cycles are interruptible. Rotational Speed: 0 to 9.999 rpm. Dwell Time: 0 to 999 seconds in 1 second increments. 115V, 1 Ph, 60 Hz, CE.

Product Details

Used Specialty Coating Systems P3201

Inventory Number: 63105
Now (USD): $7,500.00

Specialty Coating Systems P3201 Dip Coater. Precision dip coating system for coating of printed circuit boards in a production setting. Adjustable lift speeds 1 to 24 in. per min. Full coating coverage on both sides of assemblies. Removable tank. Air powered. System can be used to apply urethane, epoxy, silicone and acrylic coating as well as photo resists and solder mask materials.

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Used SVG 8632CTD/8636HPO

Inventory Number: 41192
Now (USD): $21,500.00

SVG Site Services 8632CTD/8636HPO Developer-Exposure Track. Single track developer configured with 2 elevators, one spinner and one bake. System has an OAI 0130-042-20 deep UV. 220 nanometer exposure tower capable of up to 2000W. Currently configured for 4 in. wafers.

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