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Exposure - Mask Aligners - UV Curing

Weather resistance testers, mask aligners and UV curing systems are crucial to the success of your manufacture process and you need to know they’re accurate, consistent and reliable across all conditions. When choosing second-hand, refurbished equipment, that requirement is even more critical, especially with processes as precise as the UV curing process.

Bid Service offers you a comprehensive range of used UV curing equipment, exposure testers and mask aligners, including equipment from some of the best known manufacturers in the industry. Before we pass any of our refurbished UV curing equipment and associated products on to you, we ensure we only source quality vetted machines, then painstakingly restore, refurbish and recalibrate each piece to be like-new.

We endeavour to carry a full and comprehensive range of refurbished UV curing systems, exposure testers and mask aligners and more. As refurbishers and distributors of quality second-hand UV curing machinery, our range can vary from time to time and we recommend browsing our site regularly, or getting in touch to find out if we’re carrying what you need.

We also buy used exposure testing, mask alignment and UV curing processors, so if you have any used equipment you wish to replace, or if you are moving, closing down a section of your operations, or need to sell a full operation, we will assess your second-hand equipment and make you an offer.

Used OAI Hybralign 400

Inventory Number: 61776
Now (USD): $19,500.00

Large Area Mask Aligner and Exposure System. Combines a precision mask to substrate alignment stage with a uniform, high intensity UV lightsource. System is very versatile. Splitfield microscope. UV power supply and exposure timer. 365/400 nm optics with a final lense diameter of 10 in.  115V, 50/60 Hz.

Product Details

Used OAI Model 30 - 6 inch

Inventory Number: 62503
Now (USD): $9,500.00

Collimated UV Exposure Light Source. Model 30 UV light source is highly efficient and may be utilized in a variety of applications. 360-440 mirror, 365-400 sensor. Lamp Housing: 1 kW. Power supply. Final Output Lens: 6-3/4 in.

Product Details

Used OAI Hybralign 200

Inventory Number: 61937
Now (USD): $23,650.00

High Resolution Table Top Mask Aligner and Exposure System. Configured to provide the same high accuracy and reliability as the production line Series 400 and 500 mask aligners in a smaller table top design. Quickly and gently level the substrate to mask without damage to fragile materials. The alignment module provides X,Y, Z and Theta control of the substrate and Theta motion of the mask. StereoZoom microscope, does not currently have split field optics. 500W NUV lamp housing, 365nm/400nm. Diameter Final Lense: 6-3/4 in. Currently configured with 2 in. square chuck, other sizes can be purchased. 120V, 50/60 Hz. 

Product Details

Used OAI Model 30 - 6 inch

Inventory Number: 63044
Now (USD): $9,500.00

Collimated UV Exposure Light Source. The Model 30 UV light source is highly efficient and may be utilized in a variety of applications. 360-440 mirror, 365-400 sensor. Lamp Housing: 1 kW. Final Output Lens: 6.75 in. 120V.

Product Details

Used Oriel 91293-1000

Inventory Number: 60821
Now (USD): $14,000.00

1 kW Solar UV Simulator 6 x 6 Beam. Simulates hours of solar radiation in minutes. Very high intensity UV source with minimal VIS and IR. 1000W lamp. Arc lamp power supply 400 to 1000W. Light intensity controller. Timer controller. Final Lens: 10.5 in. dia. 110-220V, 50/60 Hz, 11A, CE.

Product Details

Used Oriel 87351

Inventory Number: 62236
Now (USD): $8,500.00

Large Area Deep UV Flood Exposure System. 500W exposure housing with a beam size of 6 in. x 6 in. Spectral Range: 220nm to 260nm. Includes power supply 68811. 115-230V.

Product Details

Used Stratagene Eagle Eye II

Inventory Number: 61877
Now (USD): $450.00

Imaging System Dark Box. Box only, just what is in photos.

Product Details

Used Suss Microtec MJB4

Inventory Number: 61271
Now (USD): $59,000.00

Precision Mask Aligner and UV Exposure System. Ideal, economical tool for laboratories and small series production. In its contact exposure modes, the equipment can achieve a resolution of 0.5 μm, a performance unsurpassed in any other comparable machine. Widely used for MEMS and optoelectronics applications. It is specially configured for handling nonstandard substrates such as hybrids, high-frequency components or fragile III-V materials such as GaAs or InP. Equipped with SUSS Splitfield microscope enabling fast and highly accurate alignment.

The MJB4 is equipped with a XY Theta alignment stage using high precision, backlash-free micrometer spindles for X, Y and Theta. The travel range for X and Y is +/-5mm, for Theta +/-5 degrees. Substrate thickness compensation is easily adjustable allowing for a shift-free separation/contact movement. The manual Z-movement allows a maximum substrate thickness of up to 4mm.

Features and Benefits: Wafer and substrate handling up to dia. 100mm (wafers), 4 in. x 4 in. (substrates). Currently configured with 3 in. chuck. High precision X,Y, Theta alignment stage and microscope manipulator. Ergonomic operation. Touch panel graphical user interface.

Printing Modes: UV400: Soft Contact 2.0 micrometers. Hard Contact 1.0 micrometers. Vacuum Contact less than 0.8 micrometers. UV300: Soft Contact 2.0 micrometers. Hard Contact 1.0 micrometers. Vacuum Contact less than 0.6 micrometers.

Product Details

Used Suss Microtec MJB4

Inventory Number: 60960
Now (USD): $59,000.00

FULLY TESTED AND READY TO SHIP!

Precision Mask Aligner and UV Exposure System. Ideal, economical tool for laboratories and small series production. In its contact exposure modes, the equipment can achieve a resolution of 0.5 micrometers, a performance unsurpassed in any other comparable machine. Widely used for MEMS and optoelectronics applications. It is specially configured for handling nonstandard substrates such as hybrids, high-frequency components or fragile III-V materials such as GaAs or InP. Equipped with SUSS Splitfield microscope enabling fast and highly accurate alignment.

Features and Benefits: Wafer and substrate handling up to dia. 100mm (wafers), 4 in. x 4 in. (substrates). Currently configured with 3 in. chuck. High precision X,Y, Theta alignment stage and microscope manipulator. Ergonomic operation. Touch panel graphical user interface.

Printing Modes:
UV400: Soft Contact 2.0 micrometers. Hard Contact 1.0 micrometers.
Vacuum Contact less than 0.8 micrometers.
UV300: Soft Contact 2.0 micormeters. Hard Contact 1.0 micrometers.
Vacuum Contact less than 0.6 micrometers.

The MJB4 is equipped with a XY Theta alignment stage using high precision, backlash-free micrometer spindles for X, Y and Theta. The travel range for X and Y is +/-5mm, for Theta +/-5 degrees. Substrate thickness compensation is easily adjustable allowing for a shift-free separation/contact movement. The manual Z-movement allows a maximum substrate thickness of up to 4mm.

Product Details

Used Tamarack 152R 1000-9

Inventory Number: 56757
Now (USD): $21,500.00

Mask Alignment and Exposure System. Split field alignment with twin video cameras equipped with zoom lenses. Controlled collimation exposures. Nitrogen purge. Proximity printing. Soft contact control. Currently configured with 3-3/8 in. x 3-3/8 in. vacuum chuck and 5 in. mask. Other sizes can be purchased from manufacturer. 500/1000W UV light source. 115V, 60 Hz.

Product Details