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Four Point Probe Resistivity Mapping System. Designed to meet the needs of process development and tool characterization engineers, this four point probe has the accuracy, repeatability and reliability required. Wafer Size: 2 to 8 in. manual load. Typical Measurement Time: 1 sec. per site. Mapping Patterns: Polar map (align with notch/flat; rectangular map (choose inside edge exclusion); line scan (diameter, radius or any point to point diameter, minimum step 0.1mm); user defined (template). Measurement Range: 2 milliohms per sq. to 5 megaohms per sq. (can be optimized to 1 milliohm per sq.).