Bid Service, LLC 225 Willow Brook Rd. Freehold, NJ 07728
Phone: 732-863-9500 Fax: 732-863-1255
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Sputter Coater. Simple manual sputter coater for SEM samples. Includes external vacuum pump. No gold target with system.
Halogen Lamp Source and Power Supply. 200W output. 120/240V, 50/60 Hz.
Microwave Plasma Surface Treatment Etch System. The Microwave Plasma System 210 is ideal for: Plasma surface modification. Plasma cleaning of organic surfaces. Bond strength enhancement. Plasma etch applications. Plasma asher applications. Increased or decreased wettability. Any other plasma system application.
Controller: Windows® O/S based touchscreen interface offering fully automatic control. Multi-step recipes, real time graphic display, multi-level password access, data logging, and real time SPC monitoring of all plasma parameters is provided. Microwave Power. Display: Color 10.4-inch touch screen for control and monitoring of process parameters, automatic recipes, or manual plasma treatments.
Quartz Chamber: 9.5 in. dia. x 9 in. Four process gas inputs. Previous Gases Used: O2, CF4, N2, AR. Includes vacuum pump. 230V, 1 Ph, 50/60 Hz, CE.
Target Area: 29-1/2 in. x 4-7/8 in. Gas input. With cart for maintenance of cathode.
Magnetron cathode for sputtering over a large area. Target Size: 29-1/2 in. x 4-7/8 in.
THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR ANATECH SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL. * * * * * * * * * * * * * * * * * * * * * * * * * * Cold Deposition/Etch Sputter Coater for SEM Sample Preparation. Does not have thickness monitoring crystal. Magnetically enhanced sputter head minimizes sample heating. Etch and plasma mode for removal of organic surface contamination. Automatic slow venting at termination of process. Built-in pump. Sample stage accommodates up to 3 in. dia. substrate or 12 SEM stubs. Does not come with gold target. 115V, 60 Hz, 4A.
THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR DENTON VACUUM SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL.
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Cold Sputter and Etch System for Coating SEM Samples. Self contained cool sputter coater. Automatic or manual operation. Magnetron sputterhead. 6 in. dia. pyrex chamber. Sputtering and etch modes. Uses foil targets that can be changed in minutes (no target with unit). 120V, 60 Hz.
Parts System. Materials Research Corporation Horizontal Sputtering System. View photos to see what is included with unit. Only includes what is in the photos. No cathodes or targets. Sold separately. AS IS PARTS SYSTEM.
Sputtering Cathode and Backing Plate. Cathode assembly with backing plate for MRC 600 or 900 Series sputtering system. Fits MRC 603, 903, 943 sputtering systems.
Sputtering Cathode and Backing Plate. Cathode assembly with backing plate for MRC 600 and 900 Series sputtering systems. Fits MRC 603, 903, 943 sputtering systems.
Down Sputter System. Fully automated controlled system. Recipe storage. Hi-Vac and heat load lock with CTI pump. CTI cryo pumped main chamber. 10 kW DC supply. MRC 1.5 kW RF power supply. RF etch. Three RF/DC Planer cathodes. System will have a major PM performed and will be fully operational to the original OEM spec's.
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