||PECVD - Oxidation
ICP Plasma Etch System. Inductively coupled plasma etching system for high etch rates and control over selectivity and damage. PC controller with graphical user interface. 9.5 in. bottom electrode, ceramic clamp currently for 2 in. wafer. Chamber pumped via turbo pump with rough pump. RF Generators: RFPP5S 500W, 13.56 MHz and RFPP10M 1000W, 2 MHz. Six MFC mass flow gas controllers. Previous Gases used: CL2, SF6, N2, CF4, AR, BCL3. AS IS Price: $99,000. Refurbished: $125,000.