||PECVD - Oxidation
Large Capacity Open Loaded Plasma Enhanced Chemical Vapor Deposition System. A 460mm diameter electrode offers a capacity of up to twelve 4 in. wafers. Ideally suited for batch PECVD processing where excellent across chamber uniformity of less than 2 percent is achieved for silicon nitride and silicon dioxide layers. Last owner had set up for 2 in. wafers. 18.75 in. top electrode with shower head gas input. Footprint is kept to a minimum by locating all electronics and vacuum components within the body of the tool, mass flow controllers are housed separately in a wall mounted gas pod. Six MFC gas controllers, previously used gases He, N2, N2O, NH3, SIH4/N2, CF4. PC controller provides intuitive user interaction with the system via advanced graphics and process recipe pages. Includes vacuum pump and blower package. Mfg. 2009, nice condition.