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Inventory Number: 60678
Category: RTP
Manufacturer: AG Associates

Benchtop RTP Rapid Thermal Processor. Benchtop system for rapid thermal processing of semiconductor wafers up to 6 in. dia. max. (Depends on wafer tray with system). Programmable ramp up rates. Peak Temp.: 1350 deg C. Recommended Steady State Temp. Range: 400 to 1150 deg C. 208V, 1 Ph, 60 Hz, 90A.

Now (USD): $19,000.00

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Rapid Thermal Processing Batch Furnace. Digital controllers. Ambient to 1200 deg C. Quartz Chamber: 8 in. ID x 24 in. D. Automatic door assembly, double O-Ring vacuum sealed. 208V, 3 Ph, 60 Hz. Furnace only. No addition: Quartzware or vacuum pump.

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Rapid Thermal Processing System with Vacuum Chamber. PC controller. Temperature measurement control system provides accurate and repeatable thermal control across the temperature range. Temperatures up to 1300 deg C. Multi-zone halogen lamp furnace. Ramp Rate: 1 deg C/s to 400 deg C/s. Max. Substrate Size: 6 in. dia. Process gas lines. Includes roughing pump. 220V, 3 Ph, 50/60 Hz, 100A, CE. Unit will be tested for an accuracy of +/-5 deg C from setpoint.

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Rapid Thermal Processor. More information to come contact us for details.

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