Bid Service, LLC 225 Willow Brook Rd. Freehold, NJ 07728
Phone: 732-863-9500 Fax: 732-863-1255
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Target Area: 29-1/2 in. x 4-7/8 in. Gas input. With cart for maintenance of cathode.
THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR ANATECH SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL. * * * * * * * * * * * * * * * * * * * * * * * * * * Cold Deposition/Etch Sputter Coater for SEM Sample Preparation. Does not have thickness monitoring crystal. Magnetically enhanced sputter head minimizes sample heating. Etch and plasma mode for removal of organic surface contamination. Automatic slow venting at termination of process. Built-in pump. Sample stage accommodates up to 3 in. dia. substrate or 12 SEM stubs. Does not come with gold target. 115V, 60 Hz, 4A.
THIS UNIT IS SOLD. WE WOULD LIKE TO BUY YOUR DENTON VACUUM SYSTEMS. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL.
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Cold Sputter and Etch System for Coating SEM Samples. Self contained cool sputter coater. Automatic or manual operation. Magnetron sputterhead. 6 in. dia. pyrex chamber. Sputtering and etch modes. Uses foil targets that can be changed in minutes (no target with unit). 120V, 60 Hz.
Parts System. Materials Research Corporation Horizontal Sputtering System. View photos to see what is included with unit. Only includes what is in the photos. No cathodes or targets. Sold separately. AS IS PARTS SYSTEM.
Sputtering Cathode and Backing Plate. Cathode assembly with backing plate for MRC 600 or 900 Series sputtering system. Fits MRC 603, 903, 943 sputtering systems.
Sputtering Cathode and Backing Plate. Cathode assembly with backing plate for MRC 600 and 900 Series sputtering systems. Fits MRC 603, 903, 943 sputtering systems.
Down Sputter System. Fully automated controlled system. Recipe storage. Hi-Vac and heat load lock with CTI pump. CTI cryo pumped main chamber. 10 kW DC supply. MRC 1.5 kW RF power supply. RF etch. Three RF/DC Planer cathodes. System will have a major PM performed and will be fully operational to the original OEM spec's.
Five Target RF and DC Magnetron In Line Sputtering System. Currently configured for single sided sputtering but cathodes can be moved manually if double sided sputtering is desired. Target Size: 3-1/2 in. x 18 in. Easy access to cathodes via hinged doors. Currently configured with 4 DC and 1 RF cathodes. Multiple CTI cryopumps for high vacuum. Load lock chambers on both ends. Loader handles up to 28 20 in. H panels or pallets. Variable speed pallet transport system. Tested: $119,000. As Is Untested: $69,000.
Four Target Batch-Inline Sputtering System. The KDF 744i features full 200mm wafer capability. Using a pallet size of 19 in. x 19 in. a host of substrate sizes can be accommodated with this system. As in all inline KDF systems the user can easily change substrate sizes at will run to run. The 744i system also utilizes KDF’s family of in-house designed cathodes which cover the full spectrum of materials to be sputtered from dielectrics, magnetic materials to precious metals, KDF has a cathode to fit. The KDF 744i is equipped with all the latest in OEM technology like MKS cluster gauges and Advanced Energy pulsed power supplies. The advanced software features of the tool with a Windows 7® HMI are extensive including but not limited to auto cryo regeneration, auto pump and vent, programmable target burn-in, particle test mode, selectable slew modes, multi servo power mode selections, scan profile mode, multipass up to 9999 and repeat recipe mode.
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