||Photoresist: Coaters - Tracks
Cassette to Cassette Photoresist Developer Track with Hot Plate Bake and Chill. System was used in research environment to process 6 in. sq. substrates. Consists of two elevator units, one teflon bowl with four dispense valves, one hot plate bake unit and one cool plate. The spinner parameters are programmable via multiline control panel. The hot plate temperature range is 50 deg C to +300 deg C and is programmable. Vacuum contact, proximity and gravity contact.