Bid Service, LLC 225 Willow Brook Rd. Freehold, NJ 07728
Phone: 732-863-9500 Fax: 732-863-1255
Travel Arrangements Google Maps
Vimeo HD Equipment Videos
Bid Service YouTube Channel
Ultrasonic Tank. Tank only, no controller. 24 element 40 kHz. Inside Dimensions: 21 in. L x 12 in. W x 14 in. H.
Flexible Batch Cleaning System. Wash chamber accommodates up to 12 in. x 12 in. x 12 in. parts basket. Heated spray under immersion wash cycle. Heated open spray rinse cycle. Open loop final rinse. Internal filtration to 1 micron. Forced hot air convection drying. Mfg. 1997.
Semitool 4 in. Single Bolt Rotor.
4 Inlet Thermal Oxide Scrubber.
Exclusive Design Co. Rigid Disk Cleaning System. Uses brushes and surfactant to scrub disks. LCD display. Analog control of scrub/rinse speed and spin dry speed. 115V, 60 Hz.
CO2 Precision Surface Cleaning System. For removing micron and submicron particulate and organic contamination using carbon dioxide. When aimed at a contaminated surface the CO2 snow particles dislodge particles and remove thin film organic residues. Removing post-etch veils by momentum transfer or metal lift-off by thermal contraction and momentum transfer. Removes organic film by solvation. Cassette to cassette operation.
Megasonic Wafer Cleaning System. Robot assist between 2 tanks. Set up for 2 - 200 mm cassettes. Tank 1: 11 in. L x 20 in. W x 15 in. H is a quartz megasonic tank with 3 - 600W KAJO megasonic generators. Tank 2: 12 in. L x 20 in. W x 14 in. H is a YieldUp dryer tank with N2 purge and gas injection capability. Overall Dimensions: 60 in. L x 60 in. W x 88 in. H. Mfg. Date: 12/97.
High Speed Water Heater. Digital controller with audible alarms. Max. Pressure: 75 psi. 480V, 3 Ph, 60 Hz, 73A. Previously used on ultrasonic cleaning line.
Ultrasonic Cleaning Line. Unit has rotation mechanisms on each of the tanks that spin cages that hold parts to be cleaned. Parts Carrier Inside Dimensions: 5-3/8 in. x 5-3/8 in. x 12 in. System can also be used as a standard unit without these carriers. 3 Heated Ultrasonic Baths: 12 L x 18 in. W x 10 in. H. Hot Air Dryer: 12 in. L x 18 in. W x 10 in. H. 480V, 3 Ph, 50/60 Hz, 31A.
High Pressure Microwash Substrate Cleaning System. For sawed/scribed wafers or photomask cleaning. Utilizes an oscillating high pressure deionized water jet spray of up to 2000 psi with 0.2 micron filtration. Handles wafers up to 8 in. dia. depending on type of chuck installed. Touch screen operation. CO2 reionizer for elimination of static charge. Nitrogen dry. Infrared heat lamp. 115V, 50/60 Hz, 6A.
Note: All manufacturers names and models are used for illustrative purposes only. Any trademarks, tradenames or copyrights remain solely the property of the manufacturers. Unless otherwise stated, all items are used, and Bid Service,LLC is not a manufacturer authorized representative. All images are the property of Bid Service, LLC and may not be used for any purpose without prior written permission.