The Auto 500 box chamber system is a versatile front loading thin film system for Research & Development or preproduction. The chamber is mounted on a pedestal, housing the pumping stack. A rack panel next to the vacuum pedestal houses controls for vacuum and all thin film processes accessories. Three RF magnetron cathodes, two are 4 in. dia. and one is 3 in. dia. Rotating Substrate Carrier: 11 in. dia. Includes RF etch. Crystal film thickness monitor. Turbo pump with controller and roughing pump.