Equipment Photos

Equipment Details

Inventory Number: 60954
Category: Photoresist: Coaters - Tracks
Manufacturer: Cee Brewer Science

Photoresist Spin Coater and Hot Plate Combination Tool. Features the accuracy and repeatability needed to eliminate processing variability from photoresist and thin film deposition processes. User friendly interface touch screen with expanded multi-level programming. Can accommodate substrates up to 200mm round or 7 in. square. 115V, 50/60 Hz, 15A.

Now (USD): $9,500.00

Products Similar to: Cee Brewer Science 200CB

Used Ultrasonic Systems P450-1-151

Inventory Number: 57083
Now (USD): $25,000.00

Selective Coating System. Programmable selective coating system for precise application of a wide range of materials for the semiconductor, electronics, medical and industrial markets. Features Ultra-Spray technology which enables more accurate, thinner coating applications than conventional spray and dispensing technology. Currently configured with CAT ILDS head. Conveyor system. Graphical user interface. 115V, 50/60 Hz, 13A, CE.

Product Details

Used Cee 3000

Inventory Number: 53127
Now (USD): $4,500.00

Automated Precision Hot Plate. Digital program controller. Automated wafer transfer system for complete hands off wafer processing. Temp. Range: 50 to 300 deg C with uniformity across work surface of +/- 0.3 percent. 220V, 1 Ph, 60 Hz.

Product Details

Used Semiconductor Systems PBCS31/3

Inventory Number: 26885
Now (USD): $950.00

Dual Track System Coat and Develop. Can be configured to process wafers from 3 in. to 6 in. in dia. Track no. 1 Cassette - Bake - Coat - Bake - Cassette. Track no. 2 Cassette - Bake - Coat - Bake - Cassette. Sold AS IS.

Product Details

Used SVG Site Services 8632CTD/8636HPO

Inventory Number: 41192
Now (USD): $21,500.00

Developer-Exposure Track. Single track developer configured with 2 elevators, one spinner and one bake. System has an OAI 0130-042-20 deep UV. 220 nanometer exposure tower capable of up to 2000W. Currently configured for 4 in. wafers.

Product Details

Used FAS Technologies MicroE™ 200

Inventory Number: 42576
Now (USD): $32,000.00

Extrusion Coating System. Uses high precision extrusion technology to coat materials in a wide range of viscosities. Coats very thick layers (100 micrometers) in a single step. Repeatable digitally programmed process. Greater material utilization than spin coating (typical 75 percent of dispensed material remains on the wafer).

Product Details

Used FAS Technologies MicroE™ 200

Inventory Number: 42901
Now (USD): $39,000.00

Cassette to Cassette Extrusion Coating System with Stacked Bake/Chill Oven. System is capable of coatings over 100 micron thick in one process step with uniformities surpassing +/- 2 percent. Material utilization is 75 percent compared to 5-10 percent for spin coating. This means lower cost of material and reduced expense of waste disposal. Increased process uniformity. Uses high precision extrusion technology. Ability to coat materials in a wide range of viscosities. Repeatable digitally programmed process. With Genmark Mini Max Gencobot 7S/3L Handler. Model JS-9940 stacked bake unit with 3 ovens.

Product Details

Used MTI Multifab S3

Inventory Number: 51541
Now (USD): $750.00

Photoresist Coating Track System. Wafer is transferred from elevator to bake and spin coat modules via robotic arm. All process parameters are programmed on the system monitor using a light pen. Sold As Is.

Product Details

Used Solitec OptiTrac

Inventory Number: 51544
Now (USD): $25,000.00

Photoresist Developer. Cassette to cassette photoresist developer. Single spin develop module, 2 bake cool modules. PC controller. Small cleanroom footprint. User friendly software.

Product Details

Used MTI S3 Flexifab Parts System

Inventory Number: 51548
Now (USD): $1,450.00

S3 Photoresist Coating System. Parts system only. Includes spin, elevator and control units. Missing some parts. Call for detailed photos.

Product Details

Used Thermo Oriel ACCUDOSE 9000

Inventory Number: 53217
Now (USD): $15,000.00

Photospeed Tool Measures Batch to Batch Photospeed Variations. Photoresist testing system. Oriel part 83995 near UV system with fast shutter. Assures that exposure dosage is in-line with your process window requirements. No need to sideline your expensive stepper for photoresist testing. Provides accurate, incremented bulk area exposures across a wafer. Use it to quantify threshold exposure, spectra variations, find potential resist problems and verify lot to lot consistency.

Product Details