Photoresist: Coaters - Tracks

Integrated Solutions OPTITRAC 6" Photoresist Developer Track. Developer track is currently configured for 6" wafers. System configured with two elevators, 2 standard bake stations, 2 vented bake stations and one developer spinner station. System came out of a running facility. We are selling this as is with a 30 day right to return.

The Cee 1100FX Hot Plate is a programmable hotplate for baking resists coated on samples.  There are 10 user programs available which contain preset values for bake Ramp/Soak temperatures, bake time and bake method.  The bake method options are proximity, soft contact and hard contact.  Hard contact promotes best uniformity and minimizes bowing and warping of substrate.  Proximity bake provides slower heating of substrate which helps reduce blistering and cracking of films with fast drying solvents.  A recommended method is to use proximity bake as prebake and followed up by hard contact bake.  Each program allows up to three consecutive bake methods for maximum control of substrate warm up, solvent drying and resin curing characteristics. 

Specifications:
Bake temperature: 300 degrees C maximum
Bake temparature resolution:  1 degree C.
Substrate size: 150 to 300mm

240V, 1Ph,60Hz

Headway Research PWM32 Spinner Motor Controller.

• PWM32 Microprocessor Sequence Controller
• Up to 9 steps in one recipe
• Memory for up to 10 user-designed recipes
• User-set in each step: rpm, ramp (accel/decel), time, various I/O for accessory control (dispensers, exhaust control, lid/doors, etc.
• Speed can be manually adjusted while a recipe is running
• Operator can manually turn on the vacuum to the chuck, overriding AUTO control
• LCD interface for user input prompting and process display
• RS485 port for future communication and add-on equipment use