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Cleaning Systems

Used Jelight 256

Inventory Number: 60979
Now (USD): $9,500.00

UV Ozone Cleaner. Produces near atomically clean surfaces in less than one minute. Cleaning Tray Size: 16 in. x 16 in. Switchable dual media. Ozone killer not included, does not come with this option. 120V, 60 Hz, 10A, CE.

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Used Jelight 256

Inventory Number: 61074
Now (USD): $9,500.00

UV Ozone Cleaner. Produces near atomically clean surfaces in less than one minute. Cleaning Tray Size: 16 in. x 16 in. Switchable dual media. Ozone killer not included, does not come with this option. 120V, 60 Hz, 10A, CE.

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Used Jelight 288

Inventory Number: 61421
Now (USD): $9,500.00

UVO Ozone Cleaner. The UVO cleaner is the safest and most effective method of removing organic contaminants. The UVO cleaning method is a photosensitized oxidation process in which the contaminant molecules of photoresists, resins, human skin oils, cleaning solvent residues, silicone oils and flux are excited and/or dissociated by the absorption of short-wavelength UV radiation. Near atomically clean surfaces can be achieved in less than one minute. The process does not damage sensitive device structures of MOS gate oxide. Cleaning Tray Size: 24 in. W x 12 in. D with a max height of 1.5 in. Includes ozone killers with blowers, ozone killers are used, not new. 120V, 60 Hz.

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Used K&S 973

Inventory Number: 54710
Now (USD): $9,500.00

High Pressure Microwash Substrate Cleaning System. For sawed/scribed wafers or photomask cleaning. Utilizes an oscillating high pressure deionized water jet spray of up to 2000 psi with 0.2 micron filtration. Handles wafers up to 8 in. dia. depending on type of chuck installed. Touch screen operation. CO2 reionizer for elimination of static charge. Nitrogen dry. Infrared heat lamp. 115V, 50/60 Hz, 6A.

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Used K&S 973

Inventory Number: 54734
Now (USD): $9,500.00

High Pressure Microwash Substrate Cleaning System. For sawed/scribed wafers or photomask cleaning. Utilizes an oscillating high pressure deionized water jet spray of up to 2000 psi with 0.2 micron filtration. Handles wafers up to 8 in. dia. depending on type of chuck installed. Touch screen operation. CO2 reionizer for elimination of static charge. Nitrogen dry. Infrared heat lamp. 115V, 50/60 Hz, 6A.

Product Details

Used K&S 973

Inventory Number: 60251
Now (USD): $9,500.00

High Pressure Microwash Substrate Cleaning System. For sawed/scribed wafers or photomask cleaning. Utilizes an oscillating high pressure deionized water jet spray of up to 2000 psi with 0.2 micron filtration. Handles wafers up to 8 in. dia. depending on type of chuck installed. Touch screen operation. CO2 reionizer for elimination of static charge. Nitrogen dry. Infrared heat lamp. 115V, 50/60 Hz, 6A.

Product Details

Used K&S 971

Inventory Number: 60926
Now (USD): $7,950.00

MicroWash Wafer Cleaning Station. Handles up to 8 in. wafers. System utilizes a high pressure deionized water spray. Rapid drying feature combines variable speeds with nitrogen assist and heat lamp. 115V, 1 Ph, 60 Hz, 5A.

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Used Semitool SST614AG

Inventory Number: 57995
Now (USD): $4,950.00

Solvent Chemical Stripping and Developing Tool. Rotor for 6 in. wafers. Programmable controller with 3.5 in. floppy drive. Four liquid storage tanks. 208V, 3 Ph,, 50/60 Hz, 15A. Sold As Is.

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Used Semitool 2300S72ELH

Inventory Number: 59989
Now (USD): $12,950.00

200mm SRD Spin Rinse Dryer. Single stack front loading SRD. Capable of processing up to 8-inch 200mm wafers. Currently has Model A192-80M-0215 rotor installed. Cleans cassette of wafers using DI water spray as the cassette spins and an N2 drying process. 380V, 3 Ph, 50/60 Hz, 16A, CE. Year of Mfg.: 2008.

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Used Semitool STI PA72-40MB-0603

Inventory Number: 44013
Now (USD): $950.00

Semitool 4 in. Single Bolt Rotor.

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